DVOŘÁK, Pavel, Maroš TKÁČIK and Jiří BÉM. Probe technique for measurement of plasma potential waveform. Plasma Sources Science and Technology. Bristol: IOP Publishing, 2017, vol. 26, No 5, p. nestránkováno, 8 pp. ISSN 0963-0252. Available from: https://dx.doi.org/10.1088/1361-6595/aa6611.
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Basic information
Original name Probe technique for measurement of plasma potential waveform
Name in Czech Metoda sondového měření průběhu potenciálu plazmatu
Authors DVOŘÁK, Pavel (203 Czech Republic, guarantor, belonging to the institution), Maroš TKÁČIK (703 Slovakia, belonging to the institution) and Jiří BÉM (203 Czech Republic, belonging to the institution).
Edition Plasma Sources Science and Technology, Bristol, IOP Publishing, 2017, 0963-0252.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 3.939
RIV identification code RIV/00216224:14310/17:00096609
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1088/1361-6595/aa6611
UT WoS 000399736700001
Keywords (in Czech) potenciál plazmatu; sonda
Keywords in English plasma potential; probe
Tags NZ, rivok
Changed by Changed by: Ing. Nicole Zrilić, učo 240776. Changed: 10/4/2018 22:58.
Abstract
A method for measurement of plasma potential waveforms is presented that is based on measurement with a high-impedance probe and on an electric model of the sheath around the probe. The method was verified and compared with methods that were previously used for measurement of the temporal development of plasma potential during a RF period of capacitive discharges. Sensitivity of the method to the values of required input parameters (mean plasma potential value, electron concentration and temperature) was analyzed and it was found that with a lower precision the method can be used even without the knowledge of these input parameters. Finally, plasma potential waveforms were measured in a low-pressure capacitively coupled discharge. In agreement with theoretical models, generation of higher harmonic frequencies of plasma potential and their sensitivity to electron concentration were observed.
Abstract (in Czech)
Metoda měření potenciálu plazmatu pomocí vysokoimpedanční nekompenzované sondy. Vliv stěnové vrstvy okolo sondy je počítán modelem se skokovou změnou hustoty náboje.
Links
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
PrintDisplayed: 27/4/2024 00:52