J 2017

Probe technique for measurement of plasma potential waveform

DVOŘÁK, Pavel, Maroš TKÁČIK and Jiří BÉM

Basic information

Original name

Probe technique for measurement of plasma potential waveform

Name in Czech

Metoda sondového měření průběhu potenciálu plazmatu

Authors

DVOŘÁK, Pavel (203 Czech Republic, guarantor, belonging to the institution), Maroš TKÁČIK (703 Slovakia, belonging to the institution) and Jiří BÉM (203 Czech Republic, belonging to the institution)

Edition

Plasma Sources Science and Technology, Bristol, IOP Publishing, 2017, 0963-0252

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 3.939

RIV identification code

RIV/00216224:14310/17:00096609

Organization unit

Faculty of Science

UT WoS

000399736700001

Keywords (in Czech)

potenciál plazmatu; sonda

Keywords in English

plasma potential; probe

Tags

Změněno: 10/4/2018 22:58, Ing. Nicole Zrilić

Abstract

V originále

A method for measurement of plasma potential waveforms is presented that is based on measurement with a high-impedance probe and on an electric model of the sheath around the probe. The method was verified and compared with methods that were previously used for measurement of the temporal development of plasma potential during a RF period of capacitive discharges. Sensitivity of the method to the values of required input parameters (mean plasma potential value, electron concentration and temperature) was analyzed and it was found that with a lower precision the method can be used even without the knowledge of these input parameters. Finally, plasma potential waveforms were measured in a low-pressure capacitively coupled discharge. In agreement with theoretical models, generation of higher harmonic frequencies of plasma potential and their sensitivity to electron concentration were observed.

In Czech

Metoda měření potenciálu plazmatu pomocí vysokoimpedanční nekompenzované sondy. Vliv stěnové vrstvy okolo sondy je počítán modelem se skokovou změnou hustoty náboje.

Links

LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR