Detailed Information on Publication Record
2017
Electrochemical Preparation of Nanostructures for Amperometric and SERS Sensors
HRBÁČ, Jan, Jan ROZSYPAL, Daniel RIMAN, Vladimír HALOUZKA, Dušan HEMZAL et. al.Basic information
Original name
Electrochemical Preparation of Nanostructures for Amperometric and SERS Sensors
Authors
HRBÁČ, Jan (203 Czech Republic, guarantor, belonging to the institution), Jan ROZSYPAL (203 Czech Republic), Daniel RIMAN (203 Czech Republic), Vladimír HALOUZKA (203 Czech Republic), Dušan HEMZAL (203 Czech Republic, belonging to the institution) and Vít PAVELKA (203 Czech Republic, belonging to the institution)
Edition
1. vyd. Ústí nad Labem, XXXVII. Moderní elektrochemické metody, p. 62-65, 4 pp. 2017
Publisher
Srsenová Lenka - BEST servis Ústí nad Labem
Other information
Language
English
Type of outcome
Stať ve sborníku
Field of Study
10403 Physical chemistry
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
Publication form
printed version "print"
RIV identification code
RIV/00216224:14310/17:00096909
Organization unit
Faculty of Science
ISBN
978-80-905221-5-2
UT WoS
000432424300014
Keywords in English
electrochemical plating; electrochemical deposition; nanostructured layers; surface enhanced Raman spectroscopy; amperometry; sensors
Tags
International impact, Reviewed
Změněno: 23/4/2020 15:43, Mgr. Marie Šípková, DiS.
Abstract
V originále
Nanofabrication using electrochemical deposition ("plating") is an attractive option due to its running and equipment cost effectiveness. It allows an easy control of the deposition process with high degree of reproducibility through the possibility of adjusting a range of parameters such as voltage/current program, time, temperature, plating bath composition etc. Diverse template methods are currently popular to fabricate periodic arays of metal nanoscopic objects or patterns. However, nanostructured deposits can be achieved also by template-free electrodeposition. Volmer-Weber growth, leading directly to nanostructured metal deposits can be achieved at high overpotentials for the systems with low exchange current densities. Such deposition conditions are met at low concentrations of metal cations to be electroreduced onto a support material for which the heterogenous electron transfer rate is low. Electrochemical dissolution of metal anodes in unsupported medium such as water generates metal oxide/hydroxide material, which can be deposited on a substrate connected as a cathode in the electrochmical cell. Depending on the properties of anode-derived material (zeta potential and conductivity), metal electroreduction or electrophoretic deposition of anode-derived material can be achieved. The above-described strategy is used to deposit silver onto silicon and copper, nickel and copper-copper nickel alloy onto carbon fiber microelectrodes. The nanostructured deposits can be applied as amperometric and SERS sensors.
Links
LD15058, research and development project |
|