HRBÁČ, Jan, Jan ROZSYPAL, Daniel RIMAN, Vladimír HALOUZKA, Dušan HEMZAL and Vít PAVELKA. Electrochemical Preparation of Nanostructures for Amperometric and SERS Sensors. In Tomáš Navrátil, Miroslav Fojta, Karolina Schwarzová. XXXVII. Moderní elektrochemické metody. 1st ed. Ústí nad Labem: Srsenová Lenka - BEST servis Ústí nad Labem, 2017, p. 62-65. ISBN 978-80-905221-5-2.
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Basic information
Original name Electrochemical Preparation of Nanostructures for Amperometric and SERS Sensors
Authors HRBÁČ, Jan (203 Czech Republic, guarantor, belonging to the institution), Jan ROZSYPAL (203 Czech Republic), Daniel RIMAN (203 Czech Republic), Vladimír HALOUZKA (203 Czech Republic), Dušan HEMZAL (203 Czech Republic, belonging to the institution) and Vít PAVELKA (203 Czech Republic, belonging to the institution).
Edition 1. vyd. Ústí nad Labem, XXXVII. Moderní elektrochemické metody, p. 62-65, 4 pp. 2017.
Publisher Srsenová Lenka - BEST servis Ústí nad Labem
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10403 Physical chemistry
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Publication form printed version "print"
RIV identification code RIV/00216224:14310/17:00096909
Organization unit Faculty of Science
ISBN 978-80-905221-5-2
UT WoS 000432424300014
Keywords in English electrochemical plating; electrochemical deposition; nanostructured layers; surface enhanced Raman spectroscopy; amperometry; sensors
Tags NZ, rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Marie Šípková, DiS., učo 437722. Changed: 23/4/2020 15:43.
Abstract
Nanofabrication using electrochemical deposition ("plating") is an attractive option due to its running and equipment cost effectiveness. It allows an easy control of the deposition process with high degree of reproducibility through the possibility of adjusting a range of parameters such as voltage/current program, time, temperature, plating bath composition etc. Diverse template methods are currently popular to fabricate periodic arays of metal nanoscopic objects or patterns. However, nanostructured deposits can be achieved also by template-free electrodeposition. Volmer-Weber growth, leading directly to nanostructured metal deposits can be achieved at high overpotentials for the systems with low exchange current densities. Such deposition conditions are met at low concentrations of metal cations to be electroreduced onto a support material for which the heterogenous electron transfer rate is low. Electrochemical dissolution of metal anodes in unsupported medium such as water generates metal oxide/hydroxide material, which can be deposited on a substrate connected as a cathode in the electrochmical cell. Depending on the properties of anode-derived material (zeta potential and conductivity), metal electroreduction or electrophoretic deposition of anode-derived material can be achieved. The above-described strategy is used to deposit silver onto silicon and copper, nickel and copper-copper nickel alloy onto carbon fiber microelectrodes. The nanostructured deposits can be applied as amperometric and SERS sensors.
Links
LD15058, research and development projectName: Příprava substrátů pro povrchově zesílenou Ramanovu spektroskopii pomocí elektrochemických, elektroforetických a jiskrový výboj využívajících technik. (Acronym: ELE-SERS)
Investor: Ministry of Education, Youth and Sports of the CR
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