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@inproceedings{1384149,
author = {Franta, Daniel and Nečas, David and Ohlídal, Ivan and Giglia, Angelo},
address = {BELLINGHAM, USA},
booktitle = {Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V},
doi = {http://dx.doi.org/10.1117/12.2190104},
edition = {9628},
editor = {Duparre, A; Geyl, R},
keywords = {optical constants; optical thin films; ellipsometry; spectrophotometry},
howpublished = {tištěná verze "print"},
language = {eng},
location = {BELLINGHAM, USA},
isbn = {978-1-62841-817-0},
pages = {"96281U-1"-"96281U-12"},
publisher = {SPIE-INT SOC OPTICAL ENGINEERING},
title = {Dispersion model for optical thin films applicable in wide spectral range},
year = {2015}
}
TY - JOUR
ID - 1384149
AU - Franta, Daniel - Nečas, David - Ohlídal, Ivan - Giglia, Angelo
PY - 2015
TI - Dispersion model for optical thin films applicable in wide spectral range
PB - SPIE-INT SOC OPTICAL ENGINEERING
CY - BELLINGHAM, USA
SN - 9781628418170
KW - optical constants
KW - optical thin films
KW - ellipsometry
KW - spectrophotometry
N2 - In the optics industry thin film systems are used to construct various interference devices such as antireflective coatings, high-reflectance mirrors, beam splitters and filters. The optical characterization of complex optical systems can not be performed by measurements only in the short spectral range in which the interference devices will be employed because the measured data do not contain sufficient information about all relevant parameters of these systems. The characterization of film materials requires the extension of the spectral range of the measurements to the IR region containing phonon absorption and to the UV region containing the electronic excitations. However, this leads to necessity of a dispersion model suitable for the description of the dielectric response in the wide spectral range. Such model must respect the physical conditions following from theory of dispersion, particularly Kramers-Kronig relations and integrability imposed by sum rules. This work presents the construction of a universal dispersion model composed from individual contributions representing both electronic and phonon excitations. The efficiency of presented model is given by the fact that all the contributions are described by analytical expressions. It is shown that the model is suitable for precise modeling of spectral dependencies of optical constants of a broad class of materials used in the optical industry for thin film systems such as MgF2, SiO2, Al2O3, HfO2, Ta2O5 and TiO2 in the spectral range from far IR to vacuum UV.
ER -
FRANTA, Daniel, David NEČAS, Ivan OHLÍDAL and Angelo GIGLIA. Dispersion model for optical thin films applicable in wide spectral range. In Duparre, A; Geyl, R. \textit{Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V}. 9628th ed. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, p.~''96281U-1''-''96281U-12'', 12 pp. ISBN~978-1-62841-817-0. Available from: https://dx.doi.org/10.1117/12.2190104.
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