Detailed Information on Publication Record
2015
Wide spectral range characterization of antireflective coatings and their optimization
FRANTA, Daniel, David NEČAS, Ivan OHLÍDAL and Jiří JANKUJBasic information
Original name
Wide spectral range characterization of antireflective coatings and their optimization
Name in Czech
Charakterizace antiodrazných pokrytí a jejich optimalizace v širokém spektrálním oboru
Authors
FRANTA, Daniel (203 Czech Republic, guarantor, belonging to the institution), David NEČAS (203 Czech Republic, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution) and Jiří JANKUJ (203 Czech Republic)
Edition
9628. vyd. BELLINGHAM, USA, Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, p. "96280F-1"-"96280F-14", 14 pp. 2015
Publisher
SPIE-INT SOC OPTICAL ENGINEERING
Other information
Language
English
Type of outcome
Stať ve sborníku
Field of Study
10302 Condensed matter physics
Country of publisher
United States of America
Confidentiality degree
není předmětem státního či obchodního tajemství
Publication form
printed version "print"
RIV identification code
RIV/00216224:14310/15:00094361
Organization unit
Faculty of Science
ISBN
978-1-62841-817-0
ISSN
UT WoS
000366832100006
Keywords in English
antireflective coatings; optical thin films; ellipsometry; spectrophotometry
Tags
International impact, Reviewed
Změněno: 18/4/2018 14:31, Mgr. Michal Petr
Abstract
V originále
Development of antireflective coatings realized by thin film systems requires their characterization and optimization of their properties. Functional properties of such interference devices are determined by optical constants and thicknesses of the individual films and various defects taking place in these systems. In optics industry the characterization of the films is mostly performed in a relatively narrow spectral range using simple dispersion models and, moreover, the defects are not taken into account at all. This manner of characterization fails if applied to real-world non-ideal thin film systems because the measured data do not contain sufficient information about all the parameters describing the system including imperfections. Reliable characterization requires the following changes: extension of spectral range of measurements, combination of spectrophotometry and ellipsometry, utilization of physically correct dispersion models (Kramers-Kronig consistency, sum rules), inclusion of structural defects instrument imperfection into the models and simultaneous processing of all experimental data. This enables us to remove or reduce a correlation among the parameters searched so that correct and sufficiently precise determination of parameter values is achieved. Since the presence and properties of the defects are difficult to control independently by tuning of the deposition conditions, the optimization does not in general involve the elimination of defects. Instead they are taken into account in the design of the film systems. The outlined approach is demonstrated on the characterization and optimization of ultraviolet antireflective coating formed by double layer of Al2O3 and MgF2 deposited on fused silica.
Links
ED1.1.00/02.0068, research and development project |
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ED2.1.00/03.0086, research and development project |
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LO1411, research and development project |
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TA02010784, research and development project |
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