D 2015

Wide spectral range characterization of antireflective coatings and their optimization

FRANTA, Daniel, David NEČAS, Ivan OHLÍDAL and Jiří JANKUJ

Basic information

Original name

Wide spectral range characterization of antireflective coatings and their optimization

Name in Czech

Charakterizace antiodrazných pokrytí a jejich optimalizace v širokém spektrálním oboru

Authors

FRANTA, Daniel (203 Czech Republic, guarantor, belonging to the institution), David NEČAS (203 Czech Republic, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution) and Jiří JANKUJ (203 Czech Republic)

Edition

9628. vyd. BELLINGHAM, USA, Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, p. "96280F-1"-"96280F-14", 14 pp. 2015

Publisher

SPIE-INT SOC OPTICAL ENGINEERING

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10302 Condensed matter physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

Publication form

printed version "print"

RIV identification code

RIV/00216224:14310/15:00094361

Organization unit

Faculty of Science

ISBN

978-1-62841-817-0

ISSN

UT WoS

000366832100006

Keywords in English

antireflective coatings; optical thin films; ellipsometry; spectrophotometry

Tags

Tags

International impact, Reviewed
Změněno: 18/4/2018 14:31, Mgr. Michal Petr

Abstract

V originále

Development of antireflective coatings realized by thin film systems requires their characterization and optimization of their properties. Functional properties of such interference devices are determined by optical constants and thicknesses of the individual films and various defects taking place in these systems. In optics industry the characterization of the films is mostly performed in a relatively narrow spectral range using simple dispersion models and, moreover, the defects are not taken into account at all. This manner of characterization fails if applied to real-world non-ideal thin film systems because the measured data do not contain sufficient information about all the parameters describing the system including imperfections. Reliable characterization requires the following changes: extension of spectral range of measurements, combination of spectrophotometry and ellipsometry, utilization of physically correct dispersion models (Kramers-Kronig consistency, sum rules), inclusion of structural defects instrument imperfection into the models and simultaneous processing of all experimental data. This enables us to remove or reduce a correlation among the parameters searched so that correct and sufficiently precise determination of parameter values is achieved. Since the presence and properties of the defects are difficult to control independently by tuning of the deposition conditions, the optimization does not in general involve the elimination of defects. Instead they are taken into account in the design of the film systems. The outlined approach is demonstrated on the characterization and optimization of ultraviolet antireflective coating formed by double layer of Al2O3 and MgF2 deposited on fused silica.

Links

ED1.1.00/02.0068, research and development project
Name: CEITEC - central european institute of technology
ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
TA02010784, research and development project
Name: Optimalizace vrstevnatých systémů používaných v optickém průmyslu
Investor: Technology Agency of the Czech Republic