Possibilities and limitations of imaging spectroscopic
reflectometry in optical characterization of thin films

D 2015

Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films

OHLÍDAL, Miloslav, Ivan OHLÍDAL, David NEČAS, Jiří VODÁK, Daniel FRANTA et. al.

Basic information

Original name

Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films

Name in Czech

Možnosti a omezení zobrazovací spektroskopické reflektometrie v optické charakterizaci tenkých vrstev

Authors

OHLÍDAL, Miloslav (203 Czech Republic, guarantor), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution), David NEČAS (203 Czech Republic, belonging to the institution), Jiří VODÁK (203 Czech Republic), Daniel FRANTA (203 Czech Republic, belonging to the institution), Pavel NÁDASKÝ (203 Czech Republic) and František VIŽĎA (203 Czech Republic)

Edition

9628. vyd. BELLINGHAM, USA, Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V, p. "96280R-1"-"96280R-13", 13 pp. 2015

Publisher

SPIE-INT SOC OPTICAL ENGINEERING

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10302 Condensed matter physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

Publication form

printed version "print"

RIV identification code

RIV/00216224:14310/15:00094363

Organization unit

Faculty of Science

ISBN

978-1-62841-817-0

ISSN

DOI

http://dx.doi.org/10.1117/12.2191052

UT WoS

000366832100013

Keywords in English

Imaging spectroscopic reflectometry; non-uniform thin films; optical parameters

Abstract

V originále

It is possible to encounter thin films exhibiting various defects in practice. One of these defects is area non-uniformity in optical parameters (e.g. in thickness). Therefore it is necessary to have methods for an optical characterization of non-uniform thin films. Imaging spectroscopic reflectometry provides methods enabling us to perform an efficient optical characterization of such films. It gives a possibility to determine spectral dependencies of a local reflectance at normal incidence of light belonging to small areas (37 mu m x 37 mu m in our case) on these non-uniform films. The local reflectance is measured by individual pixels of a CCD camera serving as a detector of an imaging spectroscopic reflectometer. It is mostly possible to express the local reflectance using formulas corresponding to a uniform thin film. It allows a relatively simple treatment of the experimental data obtained by imaging spectroscopic reflectometry. There are three methods for treating these experimental data in the special case of thickness non-uniformity, i.e. in the case of the same optical constants within a certain area of the film - single pixel imaging spectroscopic reflectometry method, combination of single-pixel imaging spectroscopic reflectometry method and conventional methods (conventional single spot spectroscopic ellipsometry and spectrophotometry), and multi-pixel imaging spectroscopic reflectometry method. These methods are discussed and examples of the optical characterization of thin films non-uniform in thickness corresponding to these methods are presented in this contribution.

Links

ED1.1.00/02.0068, research and development project

Name: CEITEC - central european institute of technology

ED2.1.00/03.0086, research and development project

Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

TA02010784, research and development project

Name: Optimalizace vrstevnatých systémů používaných v optickém průmyslu

Investor: Technology Agency of the Czech Republic

Citovat

OHLÍDAL, Miloslav, Ivan OHLÍDAL, David NEČAS, Jiří VODÁK, Daniel FRANTA, Pavel NÁDASKÝ and František VIŽĎA. Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films. In Duparre, A; Geyl, R. Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V. 9628th ed. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, p. "96280R-1"-"96280R-13", 13 pp. ISBN 978-1-62841-817-0. Available from: https://dx.doi.org/10.1117/12.2191052.

@inproceedings{1384154,
   author = {Ohlídal, Miloslav and Ohlídal, Ivan and Nečas, David and Vodák, Jiří and Franta, Daniel and Nádaský, Pavel and Vižďa, František},
   address = {BELLINGHAM, USA},
   booktitle = {Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V},
   doi = {http://dx.doi.org/10.1117/12.2191052},
   edition = {9628},
   editor = {Duparre, A; Geyl, R},
   keywords = {Imaging spectroscopic reflectometry; non-uniform thin films; optical parameters},
   howpublished = {tištěná verze "print"},
   language = {eng},
   location = {BELLINGHAM, USA},
   isbn = {978-1-62841-817-0},
   pages = {"96280R-1"-"96280R-13"},
   publisher = {SPIE-INT SOC OPTICAL ENGINEERING},
   title = {Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films},
   year = {2015}
}

TY  - JOUR
ID  - 1384154
AU  - Ohlídal, Miloslav - Ohlídal, Ivan - Nečas, David - Vodák, Jiří - Franta, Daniel - Nádaský, Pavel - Vižďa, František
PY  - 2015
TI  - Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films
PB  - SPIE-INT SOC OPTICAL ENGINEERING
CY  - BELLINGHAM, USA
SN  - 9781628418170
KW  - Imaging spectroscopic reflectometry
KW  - non-uniform thin films
KW  - optical parameters
N2  - It is possible to encounter thin films exhibiting various defects in practice. One of these defects is area non-uniformity in optical parameters (e.g. in thickness). Therefore it is necessary to have methods for an optical characterization of non-uniform thin films. Imaging spectroscopic reflectometry provides methods enabling us to perform an efficient optical characterization of such films. It gives a possibility to determine spectral dependencies of a local reflectance at normal incidence of light belonging to small areas (37 mu m x 37 mu m in our case) on these non-uniform films. The local reflectance is measured by individual pixels of a CCD camera serving as a detector of an imaging spectroscopic reflectometer. It is mostly possible to express the local reflectance using formulas corresponding to a uniform thin film. It allows a relatively simple treatment of the experimental data obtained by imaging spectroscopic reflectometry. There are three methods for treating these experimental data in the special case of thickness non-uniformity, i.e. in the case of the same optical constants within a certain area of the film - single pixel imaging spectroscopic reflectometry method, combination of single-pixel imaging spectroscopic reflectometry method and conventional methods (conventional single spot spectroscopic ellipsometry and spectrophotometry), and multi-pixel imaging spectroscopic reflectometry method. These methods are discussed and examples of the optical characterization of thin films non-uniform in thickness corresponding to these methods are presented in this contribution.
ER  -

OHLÍDAL, Miloslav, Ivan OHLÍDAL, David NEČAS, Jiří VODÁK, Daniel FRANTA, Pavel NÁDASKÝ and František VIŽĎA. Possibilities and limitations of imaging spectroscopic reflectometry in optical characterization of thin films. In Duparre, A; Geyl, R. \textit{Conference on Optical Systems Design - Optical Fabrication, Testing, and Metrology V}. 9628th ed. BELLINGHAM, USA: SPIE-INT SOC OPTICAL ENGINEERING, 2015, p.~''96280R-1''-''96280R-13'', 13 pp. ISBN~978-1-62841-817-0. Available from: https://dx.doi.org/10.1117/12.2191052.

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