Tailoring the soft magnetic properties of sputtered multilayers
by microstructure engineering for high frequency applications

J 2017

Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

FALUB, Claudiu V., Hartmut ROHRMANN, Martin BLESS, Mojmír MEDUŇA, Miguel MARIONI et. al.

Basic information

Original name

Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

Name in Czech

Přizpůsobení měkkých magnetických vlastností rozprašovaných multivrstev pomocí inženýrství mikrostruktur pro vysokofrekvenční aplikace

Authors

FALUB, Claudiu V. (642 Romania), Hartmut ROHRMANN (756 Switzerland), Martin BLESS (756 Switzerland), Mojmír MEDUŇA (203 Czech Republic, guarantor, belonging to the institution), Miguel MARIONI (756 Switzerland), Daniel SCHNEIDER (756 Switzerland), Jan H. RICHTER (756 Switzerland) and Marco PADRUN (756 Switzerland)

Edition

AIP Advances, MELVILLE, AMER INST PHYSICS, 2017, 2158-3226

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 1.653

RIV identification code

RIV/00216224:14310/17:00097338

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1063/1.4973945

UT WoS

000402797100281

Keywords (in Czech)

feromagnetické rezonanční frekvence; On-chip induktory; rentgenový rozptyl; tenké vrstvy; drsnost; anizotropie; pásy

Keywords in English

ferromagnetic-resonance frequency; on-chip inductors; x-ray-scattering; thin-films; roughness; anisotropy; band

Abstract

ORIG CZ

V originále

Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system.

In Czech

Měkké magnetické tenké vrstvy Ni78.5Fe21.5, Co91.5Ta4.5Zr4 a Fe52Co28B20 vrstvené dielektrickými mezivrstvami SiO2, Al2O3, AlN a Ta2O5 byly vypěstovány na 8" Si deskách pomocí DC, pulsních DC a RF katod v průmyslovém, vysoce propustním Evatec LLS-EVO-II magnetronovém rozprašovacím systému.

Links

ED1.1.00/02.0068, research and development project

Name: CEITEC - central european institute of technology

LQ1601, research and development project

Name: CEITEC 2020 (Acronym: CEITEC2020)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

FALUB, Claudiu V., Hartmut ROHRMANN, Martin BLESS, Mojmír MEDUŇA, Miguel MARIONI, Daniel SCHNEIDER, Jan H. RICHTER and Marco PADRUN. Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications. AIP Advances. MELVILLE: AMER INST PHYSICS, 2017, vol. 7, No 5, p. nestránkováno, 7 pp. ISSN 2158-3226. Available from: https://dx.doi.org/10.1063/1.4973945.

@article{1387381,
   author = {Falub, Claudiu V. and Rohrmann, Hartmut and Bless, Martin and Meduňa, Mojmír and Marioni, Miguel and Schneider, Daniel and Richter, Jan H. and Padrun, Marco},
   article_location = {MELVILLE},
   article_number = {5},
   doi = {http://dx.doi.org/10.1063/1.4973945},
   keywords = {ferromagnetic-resonance frequency; on-chip inductors; x-ray-scattering; thin-films; roughness; anisotropy; band},
   language = {eng},
   issn = {2158-3226},
   journal = {AIP Advances},
   title = {Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications},
   url = {http://aip.scitation.org/doi/abs/10.1063/1.4973945},
   volume = {7},
   year = {2017}
}

TY  - JOUR
ID  - 1387381
AU  - Falub, Claudiu V. - Rohrmann, Hartmut - Bless, Martin - Meduňa, Mojmír - Marioni, Miguel - Schneider, Daniel - Richter, Jan H. - Padrun, Marco
PY  - 2017
TI  - Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications
JF  - AIP Advances
VL  - 7
IS  - 5
SP  - nestránkováno
EP  - nestránkováno
PB  - AMER INST PHYSICS
SN  - 21583226
KW  - ferromagnetic-resonance frequency
KW  - on-chip inductors
KW  - x-ray-scattering
KW  - thin-films
KW  - roughness
KW  - anisotropy
KW  - band
UR  - http://aip.scitation.org/doi/abs/10.1063/1.4973945
L2  - http://aip.scitation.org/doi/abs/10.1063/1.4973945
N2  - Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system.
ER  -

FALUB, Claudiu V., Hartmut ROHRMANN, Martin BLESS, Mojmír MEDUŇA, Miguel MARIONI, Daniel SCHNEIDER, Jan H. RICHTER and Marco PADRUN. Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications. \textit{AIP Advances}. MELVILLE: AMER INST PHYSICS, 2017, vol.~7, No~5, p.~nestránkováno, 7 pp. ISSN~2158-3226. Available from: https://dx.doi.org/10.1063/1.4973945.

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