FALUB, Claudiu V., Hartmut ROHRMANN, Martin BLESS, Mojmír MEDUŇA, Miguel MARIONI, Daniel SCHNEIDER, Jan H. RICHTER and Marco PADRUN. Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications. AIP Advances. MELVILLE: AMER INST PHYSICS, 2017, vol. 7, No 5, p. nestránkováno, 7 pp. ISSN 2158-3226. Available from: https://dx.doi.org/10.1063/1.4973945.
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Basic information
Original name Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications
Name in Czech Přizpůsobení měkkých magnetických vlastností rozprašovaných multivrstev pomocí inženýrství mikrostruktur pro vysokofrekvenční aplikace
Authors FALUB, Claudiu V. (642 Romania), Hartmut ROHRMANN (756 Switzerland), Martin BLESS (756 Switzerland), Mojmír MEDUŇA (203 Czech Republic, guarantor, belonging to the institution), Miguel MARIONI (756 Switzerland), Daniel SCHNEIDER (756 Switzerland), Jan H. RICHTER (756 Switzerland) and Marco PADRUN (756 Switzerland).
Edition AIP Advances, MELVILLE, AMER INST PHYSICS, 2017, 2158-3226.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.653
RIV identification code RIV/00216224:14310/17:00097338
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1063/1.4973945
UT WoS 000402797100281
Keywords (in Czech) feromagnetické rezonanční frekvence; On-chip induktory; rentgenový rozptyl; tenké vrstvy; drsnost; anizotropie; pásy
Keywords in English ferromagnetic-resonance frequency; on-chip inductors; x-ray-scattering; thin-films; roughness; anisotropy; band
Tags NZ, rivok
Tags International impact, Reviewed
Changed by Changed by: Ing. Nicole Zrilić, učo 240776. Changed: 12/4/2018 10:45.
Abstract
Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system.
Abstract (in Czech)
Měkké magnetické tenké vrstvy Ni78.5Fe21.5, Co91.5Ta4.5Zr4 a Fe52Co28B20 vrstvené dielektrickými mezivrstvami SiO2, Al2O3, AlN a Ta2O5 byly vypěstovány na 8" Si deskách pomocí DC, pulsních DC a RF katod v průmyslovém, vysoce propustním Evatec LLS-EVO-II magnetronovém rozprašovacím systému.
Links
ED1.1.00/02.0068, research and development projectName: CEITEC - central european institute of technology
LQ1601, research and development projectName: CEITEC 2020 (Acronym: CEITEC2020)
Investor: Ministry of Education, Youth and Sports of the CR
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