| ISA, Fabio, Arik JUNG, Marco SALVALAGLIO, Yadira Arroyo Rojas DASILVA, Ivan MAROZAU, Mojmír MEDUŇA, Michael BARGET, Anna MARZEGALLI, Giovanni ISELLA, Rolf ERNI, Fabio PEZZOLI, Emiliano BONERA, Philippe NIEDERMANN, Olha SEREDA, Pierangelo GRONING, Francesco MONTALENTI a Hans VON KAENEL. Strain Engineering in Highly Mismatched SiGe/Si Heterostructures. Materials Science in Semiconductor Processing. Oxford: Elsevier Science, 2017, roč. 70, November, s. 117-122. ISSN 1369-8001. Dostupné z: https://dx.doi.org/10.1016/j.mssp.2016.08.019. |
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@article{1387401,
author = {Isa, Fabio and Jung, Arik and Salvalaglio, Marco and Dasilva, Yadira Arroyo Rojas and Marozau, Ivan and Meduňa, Mojmír and Barget, Michael and Marzegalli, Anna and Isella, Giovanni and Erni, Rolf and Pezzoli, Fabio and Bonera, Emiliano and Niedermann, Philippe and Sereda, Olha and Groning, Pierangelo and Montalenti, Francesco and von Kaenel, Hans},
article_location = {Oxford},
article_number = {November},
doi = {http://dx.doi.org/10.1016/j.mssp.2016.08.019},
keywords = {Strain engineering; Dislocations; Elastic relaxation; Patterned substrates; SiGe},
language = {eng},
issn = {1369-8001},
journal = {Materials Science in Semiconductor Processing},
title = {Strain Engineering in Highly Mismatched SiGe/Si Heterostructures},
url = {http://www.sciencedirect.com/science/article/pii/S1369800116303201?via%3Dihub},
volume = {70},
year = {2017}
}
TY - JOUR
ID - 1387401
AU - Isa, Fabio - Jung, Arik - Salvalaglio, Marco - Dasilva, Yadira Arroyo Rojas - Marozau, Ivan - Meduňa, Mojmír - Barget, Michael - Marzegalli, Anna - Isella, Giovanni - Erni, Rolf - Pezzoli, Fabio - Bonera, Emiliano - Niedermann, Philippe - Sereda, Olha - Groning, Pierangelo - Montalenti, Francesco - von Kaenel, Hans
PY - 2017
TI - Strain Engineering in Highly Mismatched SiGe/Si Heterostructures
JF - Materials Science in Semiconductor Processing
VL - 70
IS - November
SP - 117-122
EP - 117-122
PB - Elsevier Science
SN - 13698001
KW - Strain engineering
KW - Dislocations
KW - Elastic relaxation
KW - Patterned substrates
KW - SiGe
UR - http://www.sciencedirect.com/science/article/pii/S1369800116303201?via%3Dihub
L2 - http://www.sciencedirect.com/science/article/pii/S1369800116303201?via%3Dihub
N2 - In this work we present an innovative approach to realise coherent, highly-mismatched 3-dimensional heterostructures on substrates patterned at the micrometre-scale.
ER -
ISA, Fabio, Arik JUNG, Marco SALVALAGLIO, Yadira Arroyo Rojas DASILVA, Ivan MAROZAU, Mojmír MEDUŇA, Michael BARGET, Anna MARZEGALLI, Giovanni ISELLA, Rolf ERNI, Fabio PEZZOLI, Emiliano BONERA, Philippe NIEDERMANN, Olha SEREDA, Pierangelo GRONING, Francesco MONTALENTI a Hans VON KAENEL. Strain Engineering in Highly Mismatched SiGe/Si Heterostructures. \textit{Materials Science in Semiconductor Processing}. Oxford: Elsevier Science, 2017, roč.~70, November, s.~117-122. ISSN~1369-8001. Dostupné z: https://dx.doi.org/10.1016/j.mssp.2016.08.019.
|
