Plasma-enhanced CVD of functional coatings in Ar/maleic
anhydride/C2H2 homogeneous dielectric barrier discharges at
atmospheric pressure

J 2017

Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure

ZAJÍČKOVÁ, Lenka, Petr JELÍNEK, Adam OBRUSNÍK, Jiří VODÁK, David NEČAS et. al.

Basic information

Original name

Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure

Authors

ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor, belonging to the institution), Petr JELÍNEK (203 Czech Republic, belonging to the institution), Adam OBRUSNÍK (203 Czech Republic, belonging to the institution), Jiří VODÁK (203 Czech Republic, belonging to the institution) and David NEČAS (203 Czech Republic, belonging to the institution)

Edition

Plasma Physics and Controlled Fusion, BRISTOL, Institute of Physics, 2017, 0741-3335

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 3.032

RIV identification code

RIV/00216224:14740/17:00097536

Organization unit

Central European Institute of Technology

DOI

http://dx.doi.org/10.1088/1361-6587/aa52e7

UT WoS

000395441600001

Keywords in English

PECVD; plasma polymerization; carboxyl films; gas dynamics simulations; atomic force microscopy

Abstract

V originále

In this contribution, we focus on the general problems of plasma-enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at atmospheric pressure is advection-driven, special attention is paid to the gas dynamics simulations, gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two of its characteristics: (i) suppression of filaments in dielectric barrier discharges, and (ii) improved film cross-linking, keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated into the deposited films, leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with respect to gas flow and the deposition time on the topography of the deposited films.

Links

LM2015041, research and development project

Name: CEITEC Nano

Investor: Ministry of Education, Youth and Sports of the CR

LQ1601, research and development project

Name: CEITEC 2020 (Acronym: CEITEC2020)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

ZAJÍČKOVÁ, Lenka, Petr JELÍNEK, Adam OBRUSNÍK, Jiří VODÁK and David NEČAS. Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure. Plasma Physics and Controlled Fusion. BRISTOL: Institute of Physics, 2017, vol. 59, No 3, p. 034003-34015. ISSN 0741-3335. Available from: https://dx.doi.org/10.1088/1361-6587/aa52e7.

@article{1389280,
   author = {Zajíčková, Lenka and Jelínek, Petr and Obrusník, Adam and Vodák, Jiří and Nečas, David},
   article_location = {BRISTOL},
   article_number = {3},
   doi = {http://dx.doi.org/10.1088/1361-6587/aa52e7},
   keywords = {PECVD; plasma polymerization; carboxyl films; gas dynamics simulations; atomic force microscopy},
   language = {eng},
   issn = {0741-3335},
   journal = {Plasma Physics and Controlled Fusion},
   title = {Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure},
   url = {http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta},
   volume = {59},
   year = {2017}
}

TY  - JOUR
ID  - 1389280
AU  - Zajíčková, Lenka - Jelínek, Petr - Obrusník, Adam - Vodák, Jiří - Nečas, David
PY  - 2017
TI  - Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure
JF  - Plasma Physics and Controlled Fusion
VL  - 59
IS  - 3
SP  - 034003
EP  - 034003
PB  - Institute of Physics
SN  - 07413335
KW  - PECVD
KW  - plasma polymerization
KW  - carboxyl films
KW  - gas dynamics simulations
KW  - atomic force microscopy
UR  - http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta
L2  - http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta
N2  - In this contribution, we focus on the general problems of plasma-enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at atmospheric pressure is advection-driven, special attention is paid to the gas dynamics simulations, gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two of its characteristics: (i) suppression of filaments in dielectric barrier discharges, and (ii) improved film cross-linking, keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated into the deposited films, leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with respect to gas flow and the deposition time on the topography of the deposited films.
ER  -

ZAJÍČKOVÁ, Lenka, Petr JELÍNEK, Adam OBRUSNÍK, Jiří VODÁK and David NEČAS. Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure. \textit{Plasma Physics and Controlled Fusion}. BRISTOL: Institute of Physics, 2017, vol.~59, No~3, p.~034003-34015. ISSN~0741-3335. Available from: https://dx.doi.org/10.1088/1361-6587/aa52e7.

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