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@article{1389280,
author = {Zajíčková, Lenka and Jelínek, Petr and Obrusník, Adam and Vodák, Jiří and Nečas, David},
article_location = {BRISTOL},
article_number = {3},
doi = {http://dx.doi.org/10.1088/1361-6587/aa52e7},
keywords = {PECVD; plasma polymerization; carboxyl films; gas dynamics simulations; atomic force microscopy},
language = {eng},
issn = {0741-3335},
journal = {Plasma Physics and Controlled Fusion},
title = {Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure},
url = {http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta},
volume = {59},
year = {2017}
}
TY - JOUR
ID - 1389280
AU - Zajíčková, Lenka - Jelínek, Petr - Obrusník, Adam - Vodák, Jiří - Nečas, David
PY - 2017
TI - Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure
JF - Plasma Physics and Controlled Fusion
VL - 59
IS - 3
SP - 034003
EP - 034003
PB - Institute of Physics
SN - 07413335
KW - PECVD
KW - plasma polymerization
KW - carboxyl films
KW - gas dynamics simulations
KW - atomic force microscopy
UR - http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta
L2 - http://iopscience.iop.org/article/10.1088/1361-6587/aa52e7/meta
N2 - In this contribution, we focus on the general problems of plasma-enhanced chemical vapor deposition in atmospheric pressure dielectric barrier discharges, i.e. deposition uniformity, film roughness and the formation of dust particles, and demonstrate them on the example of carboxyl coatings prepared by co-polymerization of acetylene and maleic anhydride. Since the transport of monomers at atmospheric pressure is advection-driven, special attention is paid to the gas dynamics simulations, gas flow patterns, velocity and residence time. By using numerical simulations, we design an optimized gas supply geometry capable of synthesizing uniform layers. The selection of the gas mixture containing acetylene was motivated by two of its characteristics: (i) suppression of filaments in dielectric barrier discharges, and (ii) improved film cross-linking, keeping the amount of functional groups high. However, acetylene discharges are prone to the formation of nanoparticles that can be incorporated into the deposited films, leading to their high roughness. Therefore, we also discuss the role of the gas composition, the spatial position of the substrate with respect to gas flow and the deposition time on the topography of the deposited films.
ER -
ZAJÍČKOVÁ, Lenka, Petr JELÍNEK, Adam OBRUSNÍK, Jiří VODÁK and David NEČAS. Plasma-enhanced CVD of functional coatings in Ar/maleic anhydride/C2H2 homogeneous dielectric barrier discharges at atmospheric pressure. \textit{Plasma Physics and Controlled Fusion}. BRISTOL: Institute of Physics, 2017, vol.~59, No~3, p.~034003-34015. ISSN~0741-3335. Available from: https://dx.doi.org/10.1088/1361-6587/aa52e7.
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