WANG, Chennan, Ondřej CAHA, Filip MÜNZ, Petr KOSTELNÍK, Tomáš NOVÁK and Josef HUMLÍČEK. Mid-infrared ellipsometry, Raman and X-ray diffraction studies of AlxGa1-xN/AlN/Si structures. Applied Surface Science. Amsterdam: Elsevier Science, 2017, vol. 421, November, p. 859-865. ISSN 0169-4332. Available from: https://dx.doi.org/10.1016/j.apsusc.2017.02.056.
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Basic information
Original name Mid-infrared ellipsometry, Raman and X-ray diffraction studies of AlxGa1-xN/AlN/Si structures
Name in Czech Studie vrstev AlxGa1-xN/AlN/Si pomocí infračervené elipsometrie, Ramanova rozptylu a rtg difrakce
Authors WANG, Chennan (156 China, guarantor, belonging to the institution), Ondřej CAHA (203 Czech Republic, belonging to the institution), Filip MÜNZ (203 Czech Republic, belonging to the institution), Petr KOSTELNÍK (203 Czech Republic), Tomáš NOVÁK (203 Czech Republic) and Josef HUMLÍČEK (203 Czech Republic, belonging to the institution).
Edition Applied Surface Science, Amsterdam, Elsevier Science, 2017, 0169-4332.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher Netherlands
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 4.439
RIV identification code RIV/00216224:14310/17:00094403
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.apsusc.2017.02.056
UT WoS 000408756700093
Keywords in English Gallium nitride; Alloy; Semiconductor; Thin film; Wafer; MOCVD; Silicon; Infrared spectroscopy; Phonon; Ellipsometry; XRD; Raman
Tags ellipsometry, Gallium Nitride, infrared spectroscopy, NZ, Raman, rivok, XRD
Tags International impact, Reviewed
Changed by Changed by: Ing. Nicole Zrilić, učo 240776. Changed: 9/4/2018 11:10.
Abstract
We report an investigation of the optical and structural properties of wurtzite phase AlxGa1-xN/AlN structure grown on Si(111) within the compositional range of 0 <= x <= 1. The study focuses on providing essential physical quantities for the fabrication process control, namely the composition dependence of phonon mode energy and refractive index. Three complementary techniques, infrared ellipsometry, Raman spectroscopy and X-ray diffraction, have been used to minimize uncertainties in our analysis. Based on the high quality and nearly strain-free AlxGa1-xN/AlN double layer samples, we determined the calibration curve for the A(1)(LO) phonon mode. We have also constructed the ellipsometry model which uses a-priori knowledge of experimentally measured A(1)(TO) phonon mode frequencies. From the best model fit to the collected ellipsometry spectra of the entire sample series, we obtained the anisotropic refractive indices of the AlxGa1-xN alloys with a very satisfactory accuracy. (C) 2017 Elsevier B.V. All rights reserved.
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TH01011284, research and development projectName: Nové polovodičové materiály a součástky s velkou šířkou zakázaného pásu
Investor: Technology Agency of the Czech Republic
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