Lattice tilt and strain mapped by X-ray scanning
nanodiffraction in compositionally graded SiGe/Si microcrystals

J 2018

Lattice tilt and strain mapped by X-ray scanning nanodiffraction in compositionally graded SiGe/Si microcrystals

MEDUŇA, Mojmír, Fabio ISA, Arik JUNG, Anna MARZEGALLI, Marco ALBANI et. al.

Basic information

Original name

Lattice tilt and strain mapped by X-ray scanning nanodiffraction in compositionally graded SiGe/Si microcrystals

Name in Czech

Mřížkový sklon a deformace mapované rtg skenováním pomocí nanodifrakce v kompozičně gradovaných SiGe/ Si mikrokrystalech

Authors

MEDUŇA, Mojmír (203 Czech Republic, guarantor, belonging to the institution), Fabio ISA (380 Italy), Arik JUNG (756 Switzerland), Anna MARZEGALLI (380 Italy), Marco ALBANI (380 Italy), Giovanni ISELLA (380 Italy), Kai ZWEIACKER (756 Switzerland), Leo MIGLIO (380 Italy) and Hans VON KÄNEL (756 Switzerland)

Edition

Journal of Applied Crystallography, Chester, INT UNION CRYSTALLOGRAPHY, 2018, 1600-5767

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 2.867

RIV identification code

RIV/00216224:14310/18:00102267

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1107/S1600576718001450

UT WoS

000429090100016

Keywords (in Czech)

skenovací rentgenová nanodifrakce; prohnutí mřížky; gradované mikrokrystaly SiGe; uvolnění pnutí

Keywords in English

scanning X-ray nanodiffraction; lattice bending; graded SiGe microcrystals; strain relaxation

Abstract

ORIG CZ

V originále

The scanning X-ray nanodiffraction technique is used to reconstruct the three- dimensional (3D) distribution of lattice strain and Ge concentration in compositionally graded Si1-xGex microcrystals epitaxially grown on Si pillars.

In Czech

Skenovací rentgenová nanodifrační technika se používá k rekonstrukci třírozměrné (3D) distribuce mřížové deformace a koncentrace Ge v kompozičně gradovaných mikrokrystalech Si1-xGex epitaxiálně rostlých na pilířích Si.

Links

CZ.02.1.01/0.0/0.0/16_013/0001728, interní kód MU

Name: CEITEC Nano+ (Acronym: CEITEC Nano)

Investor: Ministry of Education, Youth and Sports of the CR, CEITEC Nano+ (CEITEC Nano), Priority axis 1: Strengthening capacities for high-quality research

ED1.1.00/02.0068, research and development project

Name: CEITEC - central european institute of technology

Citovat

MEDUŇA, Mojmír, Fabio ISA, Arik JUNG, Anna MARZEGALLI, Marco ALBANI, Giovanni ISELLA, Kai ZWEIACKER, Leo MIGLIO and Hans VON KÄNEL. Lattice tilt and strain mapped by X-ray scanning nanodiffraction in compositionally graded SiGe/Si microcrystals. Journal of Applied Crystallography. Chester: INT UNION CRYSTALLOGRAPHY, 2018, vol. 51, No 2, p. 368-385. ISSN 1600-5767. Available from: https://dx.doi.org/10.1107/S1600576718001450.

@article{1406719,
   author = {Meduňa, Mojmír and Isa, Fabio and Jung, Arik and Marzegalli, Anna and Albani, Marco and Isella, Giovanni and Zweiacker, Kai and Miglio, Leo and von Känel, Hans},
   article_location = {Chester},
   article_number = {2},
   doi = {http://dx.doi.org/10.1107/S1600576718001450},
   keywords = {scanning X-ray nanodiffraction; lattice bending; graded SiGe microcrystals; strain relaxation},
   language = {eng},
   issn = {1600-5767},
   journal = {Journal of Applied Crystallography},
   title = {Lattice tilt and strain mapped by X-ray scanning nanodiffraction in compositionally graded SiGe/Si microcrystals},
   url = {https://onlinelibrary.wiley.com/iucr/doi/10.1107/S1600576718001450},
   volume = {51},
   year = {2018}
}

TY  - JOUR
ID  - 1406719
AU  - Meduňa, Mojmír - Isa, Fabio - Jung, Arik - Marzegalli, Anna - Albani, Marco - Isella, Giovanni - Zweiacker, Kai - Miglio, Leo - von Känel, Hans
PY  - 2018
TI  - Lattice tilt and strain mapped by X-ray scanning nanodiffraction in compositionally graded SiGe/Si microcrystals
JF  - Journal of Applied Crystallography
VL  - 51
IS  - 2
SP  - 368-385
EP  - 368-385
PB  - INT UNION CRYSTALLOGRAPHY
SN  - 16005767
KW  - scanning X-ray nanodiffraction
KW  - lattice bending
KW  - graded SiGe microcrystals
KW  - strain relaxation
UR  - https://onlinelibrary.wiley.com/iucr/doi/10.1107/S1600576718001450
N2  - The scanning X-ray nanodiffraction technique is used to reconstruct the three- dimensional (3D) distribution of lattice strain and Ge concentration in compositionally graded Si1-xGex microcrystals epitaxially grown on Si pillars.
ER  -

MEDUŇA, Mojmír, Fabio ISA, Arik JUNG, Anna MARZEGALLI, Marco ALBANI, Giovanni ISELLA, Kai ZWEIACKER, Leo MIGLIO and Hans VON KÄNEL. Lattice tilt and strain mapped by X-ray scanning nanodiffraction in compositionally graded SiGe/Si microcrystals. \textit{Journal of Applied Crystallography}. Chester: INT UNION CRYSTALLOGRAPHY, 2018, vol.~51, No~2, p.~368-385. ISSN~1600-5767. Available from: https://dx.doi.org/10.1107/S1600576718001450.

Detailed Information on Publication Record