J 2018

Atmospheric dry hydrogen plasma reduction of inkjet-printed flexible graphene oxide electrodes

HOMOLA, Tomáš, Jan POSPIŠIL, Richard KRUMPOLEC, Pavel SOUČEK, Petr DZIK et. al.

Basic information

Original name

Atmospheric dry hydrogen plasma reduction of inkjet-printed flexible graphene oxide electrodes

Authors

HOMOLA, Tomáš (703 Slovakia, guarantor, belonging to the institution), Jan POSPIŠIL (203 Czech Republic), Richard KRUMPOLEC (703 Slovakia, belonging to the institution), Pavel SOUČEK (203 Czech Republic, belonging to the institution), Petr DZIK (203 Czech Republic), Martin WEITER (203 Czech Republic) and Mirko ČERNÁK (703 Slovakia, belonging to the institution)

Edition

ChemSusChem, Germany, Wiley-VCH, 2018, 1864-5631

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

21001 Nano-materials

Country of publisher

Germany

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Impact factor

Impact factor: 7.804

RIV identification code

RIV/00216224:14310/18:00102277

Organization unit

Faculty of Science

UT WoS

000427005900016

Keywords in English

plasma treatment;hydrogen plasma;reduced graphene oxide (rGO);low-temperature processing;inkjet printing

Tags

International impact, Reviewed
Změněno: 23/4/2024 10:59, Mgr. Michal Petr

Abstract

V originále

This study concerns a low-temperature method for dry hydrogen plasma reduction of inkjet-printed flexible graphene oxide (GO) electrodes, an approach compatible with processes envisaged for the manufacture of flexible electronics. The processing of GO to reduced graphene oxide (rGO) was performed in 1–64 seconds, and sp2/sp2+sp3 carbon concentration increased from approximately 20% to 90%. Since the plasma reduction was associated with an etching effect, the optimal reduction time occurred between 8 and 16 seconds. The surface showed good mechanical stability when deposited on polyethylene terephthalate flexible foils and significantly lower sheet resistance after plasma reduction. This method for dry plasma reduction could be important for large-area hydrogenation and reduction of GO flexible surfaces, with present and potential applications in a wide variety of emerging technologies.

Links

ED2.1.00/03.0086, research and development project
Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR