FRANTA, Daniel, Adam DUBROKA, Chennan WANG, Angelo GIGLIA, Jiří VOHÁNKA, Pavel FRANTA and Ivan OHLÍDAL. Temperature-dependent dispersion model of float zone crystalline silicon. Applied Surface Science. Amsterdam: Elsevier Science, 2017, vol. 421, November, p. 405-419. ISSN 0169-4332. Available from: https://dx.doi.org/10.1016/j.apsusc.2017.02.021.
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Basic information
Original name Temperature-dependent dispersion model of float zone crystalline silicon
Authors FRANTA, Daniel (203 Czech Republic, guarantor, belonging to the institution), Adam DUBROKA (203 Czech Republic, belonging to the institution), Chennan WANG (156 China, belonging to the institution), Angelo GIGLIA (380 Italy), Jiří VOHÁNKA (203 Czech Republic, belonging to the institution), Pavel FRANTA (203 Czech Republic, belonging to the institution) and Ivan OHLÍDAL (203 Czech Republic, belonging to the institution).
Edition Applied Surface Science, Amsterdam, Elsevier Science, 2017, 0169-4332.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher Netherlands
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 4.439
RIV identification code RIV/00216224:14310/17:00094432
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.apsusc.2017.02.021
UT WoS 000408756700023
Keywords in English Crystalline silicon;Optical constants;Temperature dependence;Ellipsometry;Spectrophotometry;Sum rule
Tags NZ, rivok
Tags International impact, Reviewed
Changed by Changed by: Ing. Nicole Zrilić, učo 240776. Changed: 12/4/2018 11:59.
Abstract
In this paper, we present the temperature dependent dispersion model of float zone crystalline silicon. The theoretical background for valence electronic excitations is introduced in the theoretical part of this paper. This model is based on application of sum rules and parametrization of transition strength functions corresponding to the individual elemental phonon and electronic excitations. The parameters of the model are determined by fitting ellipsometric and spectrophotometric experimental data in the spectral range from far infrared (70 cm-1) to extreme ultraviolet (40 eV). The ellipsometric data were measured in the temperature range 5-700 K. The excitations of the valence electrons to the conduction band are divided into the indirect and direct electronic transitions. The indirect transitions are modeled by truncated Lorentzian terms, whereas the direct transitions are modeled using Gaussian broadened piecewise smooth functions representing 3D and 2D van Hove singularities modified by excitonic effects. Since the experimental data up to high energies (40 eV) are available, we are able to determine the value of the effective number of valence electrons. The Tauc-Lorentz dispersion model is used for modeling high energy electron excitations. Two slightly different values of the effective number of valence electrons are obtained for the Jellison-Modine (4.51) and Campi-Coriasso (4.37) parametrization. Our goal is to obtain the model of dielectric response of crystalline silicon which depends only on photon energy, temperature and small number of material parameters, e.g. the concentration of substituted carbon and interstitial oxygen. The model presented in this paper is accurate enough to replace tabulated values of c-Si optical constants used in the optical characterization of thin films placed onto silicon substrates. The spectral dependencies of the optical constants obtained in our work are compared to results obtained by other authors.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
LQ1601, research and development projectName: CEITEC 2020 (Acronym: CEITEC2020)
Investor: Ministry of Education, Youth and Sports of the CR
TA02010784, research and development projectName: Optimalizace vrstevnatých systémů používaných v optickém průmyslu
Investor: Technology Agency of the Czech Republic
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