KOBAYASHI, Sumire, Zdeněk BONAVENTURA, Fabien THOLIN, Nikolay A POPOV and Anne BOURDON. Study of nanosecond discharges in H-2-air mixtures at atmospheric pressure for plasma assisted combustion applications. Plasma Sources Science and Technology. Bristol: IOP Publishing Ltd., vol. 26, No 7, p. nestránkováno, 12 pp. ISSN 0963-0252. doi:10.1088/1361-6595/aa729a. 2017.
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Basic information
Original name Study of nanosecond discharges in H-2-air mixtures at atmospheric pressure for plasma assisted combustion applications
Authors KOBAYASHI, Sumire (392 Japan), Zdeněk BONAVENTURA (203 Czech Republic, guarantor, belonging to the institution), Fabien THOLIN (250 France), Nikolay A POPOV (643 Russian Federation) and Anne BOURDON (250 France).
Edition Plasma Sources Science and Technology, Bristol, IOP Publishing Ltd. 2017, 0963-0252.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 3.939
RIV identification code RIV/00216224:14310/17:00095569
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1088/1361-6595/aa729a
UT WoS 000403652400002
Keywords in English nanosecond pulsed discharge at atmospheric pressure; streamer and nanosecond spark regimes; fast gas heating processes; nonequilibrium kinetics of reactive mixtures
Tags NZ, rivok
Changed by Changed by: Ing. Nicole Zrilić, učo 240776. Changed: 12/4/2018 09:13.
Abstract
This paper presents 2D simulations of nanosecond discharges between two point electrodes for four different H2–air mixtures defined by their equivalence ratios phgr (i.e. $\phi =0$, air, $\phi =0.3$, lean mixture, $\phi =1$, stoichiometric mixture and $\phi =1.5$, rich mixture) at atmospheric pressure and at an initial temperature of 1000 K. In a first step, we have shown that the mixture composition has only a very small influence on the discharge dynamics and structure during the streamer phase and up to the formation of the plasma channel between the two point electrodes in H2–air mixtures with $\phi \in [0,1.5]$. However, as the plasma channel is formed slightly earlier as the equivalence ratio increases, for a given voltage pulse, the duration of the nanosecond spark phase increases as the equivalence ratio increases. As expected, we have shown that excited states of N2 (and in particular N2(A)) and radicals (and in particular O(D), O(P), H and OH) are very efficiently produced during the voltage pulse after the start of the spark phase. After the voltage pulse, and up to 100 ns, the densities of excited states of N2 and of O(D) decrease. Conversely, most of the O(P), H and OH radicals are produced after the voltage pulse due to the dissociative quenching of electronically excited N2. As for radicals, the gas temperature starts increasing after the start of the spark phase. For all studied mixtures, the density of O(P) atoms and the gas temperature reach their maxima after the end of the voltage pulse and the densities of O(P), H and OH radicals and the maximal gas temperature increase as the equivalence ratio increases. We have shown that the production of radicals is the highest on the discharge axis and the distribution of species after the voltage pulse and up to 100 ns has a larger diameter between the electrodes than close to both electrode tips. As for species, the temperature distribution presents two hot spots close to the point electrode tips. The non-uniform distributions of radical densities and gas temperature obtained after the nanosecond voltage pulse provide accurate initial conditions for 2D reactive flow codes to study the combustion ignition on longer timescales and compare with experiments.
Links
GA15-04023S, research and development projectName: Pokročilý výzkum kinetických procesů ve streamerových výbojích
Investor: Czech Science Foundation
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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