BERNÁTOVÁ, Katarína, Matej FEKETE, Peter KLEIN, Jaroslav HNILICA and Petr VAŠINA. Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge. In 16th International Conference on Plasma Surface Engineering. 2018.
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Basic information
Original name Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge
Name (in English) Space-resolved evolution of sputtered species number densities in HiPIMS and DCMS discharge
Authors BERNÁTOVÁ, Katarína, Matej FEKETE, Peter KLEIN, Jaroslav HNILICA and Petr VAŠINA.
Edition 16th International Conference on Plasma Surface Engineering, 2018.
Other information
Type of outcome Conference abstract
Confidentiality degree is not subject to a state or trade secret
Organization unit Faculty of Science
Keywords in English HiPIMS; Ionization fraction of sputtered species; Deposition flux
Tags International impact
Changed by Changed by: Mgr. Katarína Bernátová, Ph.D., učo 408765. Changed: 24/9/2018 09:43.
Abstract
Magnetron sputtering is a physical vapor deposition technique used in the whole spectrum of industrial applications; thus, it is crucial to characterize the process behavior thoroughly. The analysis of non-reactive Direct Current Magnetron Sputtering (DCMS) and High Power Impulse Magnetron Sputtering (HiPIMS) in the presented study is performed using a Quartz Crystal Monitor (QCM) and Optical Emission Spectroscopy (OES). The QCM system can be equipped with biasable grids or a gridless sensor with magnetic electron filter, and it is used to measure separately the flux of atoms and of the ionized particles impinging the substrate. A spectroscopic method utilizing self-absorption of the plasma and Effective Branching Fractions (EBF) is employed to evaluate the absolute ground state titanium atom and ion number densities. A systematical study on three discharge parameters – working pressure, duty cycle and distance from the titanium target - is presented. The study is realized at three different distances from the target – in the magnetized plasma region, between the target and the substrate and at the substrate level. The investigation is performed at a constant mean power and pulse duration. Both the titanium atom and titanium ion number densities are correlated with the overall atom and ion deposition fluxes at the substrate level, respectively.
Links
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
TJ01000157, research and development projectName: Optimalizace procesu depozice průmyslových ochranných povlaků
Investor: Technology Agency of the Czech Republic
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