C 2018

Universal Dispersion Model for Characterization of Thin Films Over Wide Spectral Range

FRANTA, Daniel, Jiří VOHÁNKA and Martin ČERMÁK

Basic information

Original name

Universal Dispersion Model for Characterization of Thin Films Over Wide Spectral Range

Authors

FRANTA, Daniel (203 Czech Republic, belonging to the institution), Jiří VOHÁNKA (203 Czech Republic, belonging to the institution) and Martin ČERMÁK (203 Czech Republic, belonging to the institution)

Edition

Cham, Optical Characterization of Thin Solid Films, p. 31-82, 52 pp. Springer Series in Surface Sciences, volume 64, 2018

Publisher

Springer

Other information

Language

English

Type of outcome

Kapitola resp. kapitoly v odborné knize

Field of Study

10306 Optics

Country of publisher

Switzerland

Confidentiality degree

není předmětem státního či obchodního tajemství

Publication form

printed version "print"

RIV identification code

RIV/00216224:14310/18:00104688

Organization unit

Faculty of Science

ISBN

978-3-319-75324-9

UT WoS

000441388800005

Keywords in English

Dispersion models;Dielectric response;Damped harmonic oscillators;Coupled modes;Parametrization of the joint density of states
Změněno: 28/11/2018 15:32, Mgr. Jiří Vohánka, Ph.D.

Abstract

V originále

The universal dispersion model is a collection of dispersion models (contributions to the dielectric response) describing individual elementary excitation in solids. All contributions presented in this chapter satisfy the basic conditions that follow from the theory of dispersion (time reversal symmetry, Kramers--Kronig consistency and finite sum rule integral). The individual contributions are presented in an unified formalism. In this formalism the spectral distributions of the contributions are parameterized using dispersion functions normalized with respect to the sum rule. These normalized dispersion functions must be multiplied by the transition strengths parameters which can be related to the density of charged particles. The separation of contributions into the transitions strengths and normalized spectral distributions is beneficial since it allows us to elegantly introduce the temperature dependencies into these models.

Links

LO1411, research and development project
Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR