| FRANTA, Daniel, Pavel FRANTA, Jiří VOHÁNKA, Martin ČERMÁK and Ivan OHLÍDAL. Determination of thicknesses and temperatures of crystalline silicon wafers from optical measurements in the far infrared region. Journal of Applied Physics. 2018, vol. 123, No 18, p. 185707-185717. ISSN 0021-8979. Available from: https://dx.doi.org/10.1063/1.5026195. |
Other formats:
BibTeX
LaTeX
RIS
@article{1501220,
author = {Franta, Daniel and Franta, Pavel and Vohánka, Jiří and Čermák, Martin and Ohlídal, Ivan},
article_number = {18},
doi = {http://dx.doi.org/10.1063/1.5026195},
keywords = {optical constants; temperature dependence},
language = {eng},
issn = {0021-8979},
journal = {Journal of Applied Physics},
title = {Determination of thicknesses and temperatures of crystalline silicon wafers from optical measurements in the far infrared region},
url = {http://dx.doi.org/10.1063/1.5026195},
volume = {123},
year = {2018}
}
TY - JOUR
ID - 1501220
AU - Franta, Daniel - Franta, Pavel - Vohánka, Jiří - Čermák, Martin - Ohlídal, Ivan
PY - 2018
TI - Determination of thicknesses and temperatures of crystalline silicon wafers from optical measurements in the far infrared region
JF - Journal of Applied Physics
VL - 123
IS - 18
SP - 185707
EP - 185707
SN - 00218979
KW - optical constants
KW - temperature dependence
UR - http://dx.doi.org/10.1063/1.5026195
N2 - Optical measurements of transmittance in the far infrared region performed on crystalline silicon wafers exhibit partially coherent interference effects appropriate for the determination of thicknesses of the wafers. The knowledge of accurate spectral and temperature dependencies of the optical constants of crystalline silicon in this spectral region is crucial for determination of their thickness and vice versa. The recently published temperature dependent dispersion model of crystalline silicon is suitable for this purpose. Because the linear thermal expansion of crystalline silicon is known, the temperatures of the wafers can be determined with high precision from the evolution of the interference patterns at elevated temperatures.
ER -
FRANTA, Daniel, Pavel FRANTA, Jiří VOHÁNKA, Martin ČERMÁK and Ivan OHLÍDAL. Determination of thicknesses and temperatures of crystalline silicon wafers from optical measurements in the far infrared region. \textit{Journal of Applied Physics}. 2018, vol.~123, No~18, p.~185707-185717. ISSN~0021-8979. Available from: https://dx.doi.org/10.1063/1.5026195.
|
