| BRITUN, Nikolay, Jaroslav HNILICA, Matthieu MICHIELS, Peter KLEIN, Petr VAŠINA and Rony SNYDERS. Different types of HiPIMS discharges: a comparative study via time-resolved particle imaging. PROCEEDINGS THE 15th INTERNATIONAL SYMPOSIUM ON SPUTTERING & PLASMA PROCESSES. 3-1 Yatsukaho, Hakusan, Ishikawa, Japan: Kanazawa Institute of Technology, 2019, vol. 15, p. 16-19, 209 pp. ISSN 2434-9674. |
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@article{1545269,
author = {Britun, Nikolay and Hnilica, Jaroslav and Michiels, Matthieu and Klein, Peter and Vašina, Petr and Snyders, Rony},
article_location = {3-1 Yatsukaho, Hakusan, Ishikawa, Japan},
keywords = {magnetron sputtering; HIPIMS; plasma diagnostics; particle imaging; LIF; ROAS},
language = {eng},
issn = {2434-9674},
journal = {PROCEEDINGS THE 15th INTERNATIONAL SYMPOSIUM ON SPUTTERING & PLASMA PROCESSES},
title = {Different types of HiPIMS discharges: a comparative study via time-resolved particle imaging},
volume = {15},
year = {2019}
}
TY - JFULL
ID - 1545269
AU - Britun, Nikolay - Hnilica, Jaroslav - Michiels, Matthieu - Klein, Peter - Vašina, Petr - Snyders, Rony
PY - 2019
TI - Different types of HiPIMS discharges: a comparative study via time-resolved particle imaging
JF - PROCEEDINGS THE 15th INTERNATIONAL SYMPOSIUM ON SPUTTERING & PLASMA PROCESSES
VL - 15
SP - 16-19
EP - 16-19
PB - Kanazawa Institute of Technology
SN - 24349674
KW - magnetron sputtering
KW - HIPIMS
KW - plasma diagnostics
KW - particle imaging
KW - LIF
KW - ROAS
N2 - High power impulse magnetron sputtering (HiPIMS) discharges often use a single pulse, when a negative voltage (0.5 - 1.5 kV typically) and very high currents (several hundred A) are applied to the cathode during the plasma on time. Such ‘single pulse’ HiPIMS (s-HiPIMS) discharges have several limitations, first of all in terms of the ion control, and HiPIMS supporting multiple pulse operation such as bipolar HiPIMS (b-HiPIMS, or BPH) or multi-pulse HiPIMS (m-HiPIMS) have been proposed several years ago. In our study, the effects of variation of the applied power, plasma pulse duration, pulse positive voltage (b-HiPIMS case), delay between the plasma pulses and their number (m-HiPIMS case), as well as the other effects were examined. As a result, the beneficial effect of bipolar HiPIMS pulsing is shown. The ion acceleration and altering film microstructure are evident in this case. Along with this, the effect of an optimum pulse number for better ionization control in the m-HiPIMS case is also demonstrated. This phenomenon is related to a proper synchronization between the wave of ions propagating from the cathode and the following m-HiPIMS pulse.
ER -
BRITUN, Nikolay, Jaroslav HNILICA, Matthieu MICHIELS, Peter KLEIN, Petr VAŠINA and Rony SNYDERS. Different types of HiPIMS discharges: a comparative study via time-resolved particle imaging. \textit{PROCEEDINGS THE 15th INTERNATIONAL SYMPOSIUM ON SPUTTERING \&{} PLASMA PROCESSES}. 3-1 Yatsukaho, Hakusan, Ishikawa, Japan: Kanazawa Institute of Technology, 2019, vol.~15, p.~16-19, 209 pp. ISSN~2434-9674.
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