Combination of spectroscopic ellipsometry and spectroscopic
reflectometry with including light scattering in the optical
characterization of randomly rough silicon surfaces covered by
native oxide layers

J 2019

Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers

OHLÍDAL, Ivan, Jiří VOHÁNKA, Martin ČERMÁK and Daniel FRANTA

Basic information

Original name

Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers

Authors

OHLÍDAL, Ivan (203 Czech Republic, guarantor, belonging to the institution), Jiří VOHÁNKA (203 Czech Republic, belonging to the institution), Martin ČERMÁK (203 Czech Republic, belonging to the institution) and Daniel FRANTA (203 Czech Republic, belonging to the institution)

Edition

Surface Topography: Metrology and Properties, BRISTOL, OP PUBLISHING LTD, 2019, 2051-672X

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10306 Optics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 1.613

RIV identification code

RIV/00216224:14310/19:00111208

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1088/2051-672x/ab359d

UT WoS

000487217500004

Keywords in English

optical characterization;surface roughness;spectroscopic ellipsometry;spectroscopic reflectometry

Abstract

V originále

A combined method of spectroscopic ellipsometry and spectroscopic reflectometry is employed for the optical characterization of randomly rough surfaces of silicon single crystal covered with very thin native oxide layers within spectral range 197–1240 nm (1.0–6.3 eV). It is shown that random roughness of the samples of this system exhibits a wide interval of spatial frequencies so that the Rayleigh–Rice theory, scalar diffraction theory for coherent light and scalar diffraction theory with including light scattering must be used to achieve good fits of experimental data. The ellipsometric data are compatible with the Rayleigh–Rice theory within the entire spectral range while the reflectometric data must be processed separately within two sub-ranges using two different theoretical approaches. In one of the sub-ranges the combination of Rayleigh–Rice theory and scalar diffraction theory for coherent light is utilized for obtaining good fits of the corresponding experimental data of reflectance. Within the latter sub-range the scalar diffraction theory including the influence of light scattering on reflectance enables us to achieve good fits. Further, it is shown that using this combined method the values of basic roughness parameters, i.e. the rms values of heights, autocorrelation lengths and rms values of slopes of roughness irregularities, can be determined together with thickness values of the native oxide layers. A comparison of the results achieved optically with those determined by atomic force microscopy is performed. The assessment of efficiency of spectroscopic ellipsometry and spectroscopic reflectometry in characterizing random roughness with the wide interval of spatial frequencies is also presented.

Links

LO1411, research and development project

Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

OHLÍDAL, Ivan, Jiří VOHÁNKA, Martin ČERMÁK and Daniel FRANTA. Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers. Surface Topography: Metrology and Properties. BRISTOL: OP PUBLISHING LTD, 2019, vol. 7, No 4, p. 1-12. ISSN 2051-672X. Available from: https://dx.doi.org/10.1088/2051-672x/ab359d.

@article{1577317,
   author = {Ohlídal, Ivan and Vohánka, Jiří and Čermák, Martin and Franta, Daniel},
   article_location = {BRISTOL},
   article_number = {4},
   doi = {http://dx.doi.org/10.1088/2051-672x/ab359d},
   keywords = {optical characterization;surface roughness;spectroscopic ellipsometry;spectroscopic reflectometry},
   language = {eng},
   issn = {2051-672X},
   journal = {Surface Topography: Metrology and Properties},
   title = {Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers},
   url = {https://doi.org/10.1088/2051-672X/ab359d},
   volume = {7},
   year = {2019}
}

TY  - JOUR
ID  - 1577317
AU  - Ohlídal, Ivan - Vohánka, Jiří - Čermák, Martin - Franta, Daniel
PY  - 2019
TI  - Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers
JF  - Surface Topography: Metrology and Properties
VL  - 7
IS  - 4
SP  - 1-12
EP  - 1-12
PB  - OP PUBLISHING LTD
SN  - 2051672X
KW  - optical characterization;surface roughness;spectroscopic ellipsometry;spectroscopic reflectometry
UR  - https://doi.org/10.1088/2051-672X/ab359d
L2  - https://doi.org/10.1088/2051-672X/ab359d
N2  - A combined method of spectroscopic ellipsometry and spectroscopic reflectometry is employed for the optical characterization of randomly rough surfaces of silicon single crystal covered with very thin native oxide layers within spectral range 197–1240 nm (1.0–6.3 eV). It is shown that random roughness of the samples of this system exhibits a wide interval of spatial frequencies so that the Rayleigh–Rice theory, scalar diffraction theory for coherent light and scalar diffraction theory with including light scattering must be used to achieve good fits of experimental data. The ellipsometric data are compatible with the Rayleigh–Rice theory within the entire spectral range while the reflectometric data must be processed separately within two sub-ranges using two different theoretical approaches. In one of the sub-ranges the combination of Rayleigh–Rice theory and scalar diffraction theory for coherent light is utilized for obtaining good fits of the corresponding experimental data of reflectance. Within the latter sub-range the scalar diffraction theory including the influence of light scattering on reflectance enables us to achieve good fits. Further, it is shown that using this combined method the values of basic roughness parameters, i.e. the rms values of heights, autocorrelation lengths and rms values of slopes of roughness irregularities, can be determined together with thickness values of the native oxide layers. A comparison of the results achieved optically with those determined by atomic force microscopy is performed. The assessment of efficiency of spectroscopic ellipsometry and spectroscopic reflectometry in characterizing random roughness with the wide interval of spatial frequencies is also presented.
ER  -

OHLÍDAL, Ivan, Jiří VOHÁNKA, Martin ČERMÁK and Daniel FRANTA. Combination of spectroscopic ellipsometry and spectroscopic reflectometry with including light scattering in the optical characterization of randomly rough silicon surfaces covered by native oxide layers. \textit{Surface Topography: Metrology and Properties}. BRISTOL: OP PUBLISHING LTD, 2019, vol.~7, No~4, p.~1-12. ISSN~2051-672X. Available from: https://dx.doi.org/10.1088/2051-672x/ab359d.

Detailed Information on Publication Record