| OHLÍDAL, Ivan, Jiří VOHÁNKA, Daniel FRANTA, Martin ČERMÁK, Jaroslav ŽENÍŠEK and Petr VAŠINA. Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films. Journal of Electrical Engineering. Slovenská technická univezita v Bratislavě, 2019, vol. 70, No 7, p. 16-26. ISSN 1335-3632. Available from: https://dx.doi.org/10.2478/jee-2019-0037. |
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@article{1577436,
author = {Ohlídal, Ivan and Vohánka, Jiří and Franta, Daniel and Čermák, Martin and Ženíšek, Jaroslav and Vašina, Petr},
article_number = {7},
doi = {http://dx.doi.org/10.2478/jee-2019-0037},
keywords = {ellipsometric parameters;inhomogeneous thin films;optical characterization;reflectance},
language = {eng},
issn = {1335-3632},
journal = {Journal of Electrical Engineering},
title = {Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films},
url = {https://doi.org/10.2478/jee-2019-0037},
volume = {70},
year = {2019}
}
TY - JOUR
ID - 1577436
AU - Ohlídal, Ivan - Vohánka, Jiří - Franta, Daniel - Čermák, Martin - Ženíšek, Jaroslav - Vašina, Petr
PY - 2019
TI - Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films
JF - Journal of Electrical Engineering
VL - 70
IS - 7
SP - 16-26
EP - 16-26
PB - Slovenská technická univezita v Bratislavě
SN - 13353632
KW - ellipsometric parameters;inhomogeneous thin films;optical characterization;reflectance
UR - https://doi.org/10.2478/jee-2019-0037
L2 - https://doi.org/10.2478/jee-2019-0037
N2 - In this paper the overview of the most important approximate methods for the optical characterization of inhomogeneous thin films is presented. The following approximate methods are introduced: Wentzel-Kramers-Brillouin-Jeffreys approximation, method based on substituting inhomogeneous thin films by multilayer systems, method based on modifying recursive approach and method utilizing multiple-beam interference model. Principles and mathematical formulations of these methods are described. A comparison of these methods is carried out from the practical point of view, ie advantages and disadvantages of individual methods are discussed. Examples of the optical characterization of three inhomogeneous thin films consisting of non-stoichiometric silicon nitride are introduced in order to illustrate efficiency and practical meaning of the presented approximate methods.
ER -
OHLÍDAL, Ivan, Jiří VOHÁNKA, Daniel FRANTA, Martin ČERMÁK, Jaroslav ŽENÍŠEK and Petr VAŠINA. Approximate methods for the optical characterization of inhomogeneous thin films: Applications to silicon nitride films. \textit{Journal of Electrical Engineering}. Slovenská technická univezita v Bratislavě, 2019, vol.~70, No~7, p.~16-26. ISSN~1335-3632. Available from: https://dx.doi.org/10.2478/jee-2019-0037.
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