HUMLÍČEK, Josef, Karla KULDOVA, Richard KRUMPOLEC and David Campbell CAMERON. Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. MELVILLE: A V S AMER INST PHYSICS, 2019, vol. 37, No 5, p. 1-5. ISSN 2166-2746. Available from: https://dx.doi.org/10.1116/1.5121240.
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Basic information
Original name Ellipsometry, reflectance, and photoluminescence of nanocrystalline CuCl thin films on silicon
Authors HUMLÍČEK, Josef (203 Czech Republic, guarantor, belonging to the institution), Karla KULDOVA (203 Czech Republic), Richard KRUMPOLEC (703 Slovakia, belonging to the institution) and David Campbell CAMERON (826 United Kingdom of Great Britain and Northern Ireland, belonging to the institution).
Edition JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, MELVILLE, A V S AMER INST PHYSICS, 2019, 2166-2746.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10302 Condensed matter physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.511
RIV identification code RIV/00216224:14310/19:00107822
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1116/1.5121240
UT WoS 000492054300010
Keywords in English copper halides; ellipsometry; optical spectroscopy
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Marie Šípková, DiS., učo 437722. Changed: 15/2/2023 10:13.
Abstract
The authors have used sequential pulsed vapor deposition to prepare thin films of copper(I) chloride (CuCl) on silicon. The films are nanocrystalline and show a very strong ultraviolet luminescence. The excitonic response and corresponding luminescent properties make these films promising for new short-wavelength photonic/photoelectronic devices. The authors have undertaken systematic studies of these films, using the potential of multiple-angle-of-incidence spectroellipsometry with a rotating compensator, normal-incidence reflectance with small illuminated spots, and photoluminescence with high spatial resolution. The silicon substrate presents specific problems in the interpretation of the ellipsometric and reflectance spectra, as the excitonic multiplets of CuCl are close to the E-1 interband spectral structure of Si. The authors discuss appropriate procedures to isolate the response of the thin films In addition, since the coverage of the substrates typically shows inhomogeneity, care has to be taken in accounting for its presence. A consistent picture of the passive and active excitonic response of the films results from the multitude of experimental techniques used. Published by the AVS.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
GA17-02328S, research and development projectName: UVIHOPE Ultrafialová halogenidová optoelektronika (Acronym: UVIHOPE)
Investor: Czech Science Foundation
LM2015041, research and development projectName: CEITEC Nano
Investor: Ministry of Education, Youth and Sports of the CR
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