OHLÍDAL, Ivan, Jiří VOHÁNKA, Jan MISTRÍK, Martin ČERMÁK, František VIŽĎA and Daniel FRANTA. Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model. Thin Solid Films. Elsevier, 2019, vol. 692, 31 December 2019, p. 1-17. ISSN 0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2019.03.001.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Approximations of reflection and transmission coefficients of inhomogeneous thin films based on multiple-beam interference model
Authors OHLÍDAL, Ivan (203 Czech Republic, guarantor, belonging to the institution), Jiří VOHÁNKA (203 Czech Republic, belonging to the institution), Jan MISTRÍK (203 Czech Republic, belonging to the institution), Martin ČERMÁK (203 Czech Republic, belonging to the institution), František VIŽĎA (203 Czech Republic) and Daniel FRANTA (203 Czech Republic, belonging to the institution).
Edition Thin Solid Films, Elsevier, 2019, 0040-6090.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10306 Optics
Country of publisher Switzerland
Confidentiality degree is not subject to a state or trade secret
WWW odkaz na stránku nakladatele
Impact factor Impact factor: 2.030
RIV identification code RIV/00216224:14310/19:00112003
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.tsf.2019.03.001
UT WoS 000499678700004
Keywords in English Reflectance;Transmittance;Ellipsometric parameters;Inhomogeneous thin films
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Marie Šípková, DiS., učo 437722. Changed: 28/3/2020 14:05.
Abstract
A multiple-beam interference model is used to derive approximate formulae for the reflection and transmission coefficients of inhomogeneous thin films exhibiting large gradients of refractive index profiles. It is shown that these formulae are constituted by series containing the Wentzel-Kramers-Brillouin-Jeffreys term and correction terms with increasing order corresponding to number of considered internal reflections inside the films. A numerical analysis enabling us to show the influence of a degree of inhomogeneity on spectral dependencies of reflectance and ellipsometric parameters of inhomogeneous films is performed. Advantages and disadvantages of our approach compared with other approximate approaches are discussed. The optical characterization of a selected non-stoichiometric silicon nitride film prepared by reactive magnetron sputtering onto silicon single crystal substrate is performed for illustration of using our formulae in practice.
Links
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
PrintDisplayed: 12/9/2024 08:06