Optical characterization of inhomogeneous thin films containing
transition layers using the combined method of spectroscopic
ellipsometry and spectroscopic reflectometry based on
multiple-beam interference model

J 2019

Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model

OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Jaroslav ŽENÍŠEK, Petr VAŠINA et. al.

Basic information

Original name

Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model

Authors

OHLÍDAL, Ivan (203 Czech Republic, belonging to the institution), Jiří VOHÁNKA (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution), Jaroslav ŽENÍŠEK (203 Czech Republic, belonging to the institution), Petr VAŠINA (203 Czech Republic, belonging to the institution), Martin ČERMÁK (203 Czech Republic, belonging to the institution) and Daniel FRANTA (203 Czech Republic, belonging to the institution)

Edition

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 2019, 2166-2746

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10306 Optics

Country of publisher

United States of America

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 1.511

RIV identification code

RIV/00216224:14310/19:00107920

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1116/1.5122014

UT WoS

000522021700072

Keywords in English

Optical constants;Optical absorption;Reflectometry;Magnetron sputtering;Optical metrology;Thin films;Chemical vapor deposition;Optical properties

Abstract

V originále

This paper presents the results of the optical characterization of inhomogeneous thin films of polymer-like SiOxCyHz and non-stoichiometric silicon nitride SiNx. An efficient method combining variable angle spectroscopic ellipsometry and spectroscopic reflectometry applied at the near-normal incidence based on the multiple-beam interference model is utilized for this optical characterization. The multiple-beam interference model allows us to quickly evaluate the values of ellipsometric parameters and reflectance of the inhomogeneous thin films, which exhibit general profiles of their optical constants. The spectral dependencies of the optical constants of the inhomogeneous SiOxCyHz and SiNx thin films are determined using the Campi–Coriasso dispersion model. The profiles of the optical constants of these films can also be determined. Furthermore, the transition layers at the lower boundaries of the characterized films are also taken into account. Spectral dependencies of the optical constants of these transition layers are also determined using the Campi–Coriasso dispersion model.

Links

GA19-15240S, research and development project

Name: Multifunkční nanokompozitní polymerní tenké vrstvy s řízenými povrchovými a mechanickými vlastnostmi připravené v RF prachovém plazmatu

Investor: Czech Science Foundation

LO1411, research and development project

Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Jaroslav ŽENÍŠEK, Petr VAŠINA, Martin ČERMÁK and Daniel FRANTA. Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model. Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 2019, vol. 37, No 6, p. "062921-1"-"062921-10", 10 pp. ISSN 2166-2746. Available from: https://dx.doi.org/10.1116/1.5122014.

@article{1598865,
   author = {Ohlídal, Ivan and Vohánka, Jiří and Buršíková, Vilma and Ženíšek, Jaroslav and Vašina, Petr and Čermák, Martin and Franta, Daniel},
   article_number = {6},
   doi = {http://dx.doi.org/10.1116/1.5122014},
   keywords = {Optical constants;Optical absorption;Reflectometry;Magnetron sputtering;Optical metrology;Thin films;Chemical vapor deposition;Optical properties},
   language = {eng},
   issn = {2166-2746},
   journal = {Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics},
   title = {Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model},
   url = {https://doi.org/10.1116/1.5122014},
   volume = {37},
   year = {2019}
}

TY  - JOUR
ID  - 1598865
AU  - Ohlídal, Ivan - Vohánka, Jiří - Buršíková, Vilma - Ženíšek, Jaroslav - Vašina, Petr - Čermák, Martin - Franta, Daniel
PY  - 2019
TI  - Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model
JF  - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
VL  - 37
IS  - 6
SP  - "062921-1"-"062921-10"
EP  - "062921-1"-"062921-10"
SN  - 21662746
KW  - Optical constants;Optical absorption;Reflectometry;Magnetron sputtering;Optical metrology;Thin films;Chemical vapor deposition;Optical properties
UR  - https://doi.org/10.1116/1.5122014
L2  - https://doi.org/10.1116/1.5122014
N2  - This paper presents the results of the optical characterization of inhomogeneous thin films of polymer-like SiOxCyHz and non-stoichiometric silicon nitride SiNx. An efficient method combining variable angle spectroscopic ellipsometry and spectroscopic reflectometry applied at the near-normal incidence based on the multiple-beam interference model is utilized for this optical characterization. The multiple-beam interference model allows us to quickly evaluate the values of ellipsometric parameters and reflectance of the inhomogeneous thin films, which exhibit general profiles of their optical constants. The spectral dependencies of the optical constants of the inhomogeneous SiOxCyHz and SiNx thin films are determined using the Campi–Coriasso dispersion model. The profiles of the optical constants of these films can also be determined. Furthermore, the transition layers at the lower boundaries of the characterized films are also taken into account. Spectral dependencies of the optical constants of these transition layers are also determined using the Campi–Coriasso dispersion model.
ER  -

OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Jaroslav ŽENÍŠEK, Petr VAŠINA, Martin ČERMÁK and Daniel FRANTA. Optical characterization of inhomogeneous thin films containing transition layers using the combined method of spectroscopic ellipsometry and spectroscopic reflectometry based on multiple-beam interference model. \textit{Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics}. 2019, vol.~37, No~6, p.~''062921-1''-''062921-10'', 10 pp. ISSN~2166-2746. Available from: https://dx.doi.org/10.1116/1.5122014.

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