OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Daniel FRANTA and Martin ČERMÁK. Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers. Optics Express. Washington, D.C.: OPTICAL SOC AMER, 2020, vol. 28, No 1, p. 160-174. ISSN 1094-4087. Available from: https://dx.doi.org/10.1364/OE.28.000160. |
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@article{1598881, author = {Ohlídal, Ivan and Vohánka, Jiří and Buršíková, Vilma and Franta, Daniel and Čermák, Martin}, article_location = {Washington, D.C.}, article_number = {1}, doi = {http://dx.doi.org/10.1364/OE.28.000160}, keywords = {Amorphous silicon; Extinction coefficients; Light scattering; Optical constants; Refractive index; Thin films}, language = {eng}, issn = {1094-4087}, journal = {Optics Express}, title = {Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers}, url = {https://doi.org/10.1364/OE.28.000160}, volume = {28}, year = {2020} }
TY - JOUR ID - 1598881 AU - Ohlídal, Ivan - Vohánka, Jiří - Buršíková, Vilma - Franta, Daniel - Čermák, Martin PY - 2020 TI - Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers JF - Optics Express VL - 28 IS - 1 SP - 160-174 EP - 160-174 PB - OPTICAL SOC AMER SN - 10944087 KW - Amorphous silicon KW - Extinction coefficients KW - Light scattering KW - Optical constants KW - Refractive index KW - Thin films UR - https://doi.org/10.1364/OE.28.000160 L2 - https://doi.org/10.1364/OE.28.000160 N2 - In this paper the complete optical characterization of an inhomogeneous polymer-like thin film of SiOxCyHz exhibiting a thickness non-uniformity and transition layer at the boundary between the silicon substrate and this film is performed using variable angle spectroscopic ellipsometry. The Campi-Coriasso dispersion model was utilized for describing the spectral dependencies of the optical constants of the SiOxCyHz thin film and transition layer. The multiple-beam interference model was used for expressing inhomogeneity of the SiOxCyHz thin film. The thickness non-uniformity of this film was taken into account by means of the averaging of the elements of the Mueller matrix performed using the thickness distribution for the wedge-shaped non-uniformity. The spectral dependencies of the optical constants of the SiOxCyHz thin film at the upper and lower boundaries together with the spectral dependencies of the optical constants of the transition layer were determined. Furthermore, the thickness values of the SiOxCyHz film and transition layer, profiles of the optical constants of the SiOxCyHz thin film and the rms value of local thicknesses corresponding to its thickness non-uniformity were determined. Thus, all the parameters characterizing this complicated film were determined without any auxiliary methods. ER -
OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Daniel FRANTA and Martin ČERMÁK. Spectroscopic ellipsometry of inhomogeneous thin films exhibiting thickness non-uniformity and transition layers. \textit{Optics Express}. Washington, D.C.: OPTICAL SOC AMER, 2020, vol.~28, No~1, p.~160-174. ISSN~1094-4087. Available from: https://dx.doi.org/10.1364/OE.28.000160.
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