| CHARVOT, Jaroslav, Danie POKORNÝ, Raul ZAZPE, Richard KRUMPOLEC, David PAVLIŇÁK, Luděk HROMÁDKO, Jan PŘIKRYL, Jhonatan RODRIGUEZ‐PEREIRA, Milan KLIKAR, Veronika JELÍNKOVÁ, Jan M MACAK and Filip BUREŠ. Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition. ChemPlusChem. WEINHEIM (GERMANY): Wiley - Verlag Chemie, 2020, vol. 85, No 3, p. 576-579. ISSN 2192-6506. Available from: https://dx.doi.org/10.1002/cplu.202000108. |
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@article{1645964,
author = {Charvot, Jaroslav and Pokorný, Danie and Zazpe, Raul and Krumpolec, Richard and Pavliňák, David and Hromádko, Luděk and Přikryl, Jan and Rodriguez‐Pereira, Jhonatan and Klikar, Milan and Jelínková, Veronika and Macak, Jan M and Bureš, Filip},
article_location = {WEINHEIM (GERMANY)},
article_number = {3},
doi = {http://dx.doi.org/10.1002/cplu.202000108},
keywords = {atomic layer deposition; molybdenum; nanostructures; selenium; transition metal dichalcogenides},
language = {eng},
issn = {2192-6506},
journal = {ChemPlusChem},
title = {Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition},
url = {http://dx.doi.org/10.1002/cplu.202000108},
volume = {85},
year = {2020}
}
TY - JOUR
ID - 1645964
AU - Charvot, Jaroslav - Pokorný, Danie - Zazpe, Raul - Krumpolec, Richard - Pavliňák, David - Hromádko, Luděk - Přikryl, Jan - Rodriguez‐Pereira, Jhonatan - Klikar, Milan - Jelínková, Veronika - Macak, Jan M - Bureš, Filip
PY - 2020
TI - Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition
JF - ChemPlusChem
VL - 85
IS - 3
SP - 576-579
EP - 576-579
PB - Wiley - Verlag Chemie
SN - 21926506
KW - atomic layer deposition
KW - molybdenum
KW - nanostructures
KW - selenium
KW - transition metal dichalcogenides
UR - http://dx.doi.org/10.1002/cplu.202000108
L2 - http://dx.doi.org/10.1002/cplu.202000108
N2 - Three cyclic silylselenides were prepared in a straightforward manner. Property tuning has been achieved by varying the ring size and the number of embedded selenium atoms. All silylselenides possess improved resistance towards moisture and oxidation as well as high thermal robustness and sufficient volatility with almost zero residues. The six-membered diselenide proved to be particularly superior Se precursors for atomic layer deposition and allowed facile preparation of MoSe2 layers. Their structure and composition have been investigated by Raman and X-ray photoelectron spectroscopy as well as scanning electron microscopy revealing vertically aligned flaky shaped nanosheets.
ER -
CHARVOT, Jaroslav, Danie POKORNÝ, Raul ZAZPE, Richard KRUMPOLEC, David PAVLIŇÁK, Luděk HROMÁDKO, Jan PŘIKRYL, Jhonatan RODRIGUEZ‐PEREIRA, Milan KLIKAR, Veronika JELÍNKOVÁ, Jan M MACAK and Filip BUREŠ. Cyclic Silylselenides: Convenient Selenium Precursors for Atomic Layer Deposition. \textit{ChemPlusChem}. WEINHEIM (GERMANY): Wiley - Verlag Chemie, 2020, vol.~85, No~3, p.~576-579. ISSN~2192-6506. Available from: https://dx.doi.org/10.1002/cplu.202000108.
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