FALTÝNEK, Jan, Jaroslav HNILICA and Vít KUDRLE. MICROWAVE INTERFEROMETRY OF ATMOSPHERIC PRESSURE PLASMA JET. Online. In Cernak, M Hoder, T. HAKONE XV: INTERNATIONAL SYMPOSIUM ON HIGH PRESSURE LOW TEMPERATURE PLASMA CHEMISTRY: WITH JOINT COST TD1208 WORKSHOP: NON-EQUILIBRIUM PLASMAS WITH LIQUIDS FOR WATER AND SURFACE TREATMENT. BRNO: MASARYKOVA UNIV, 2016, p. 152-154. ISBN 978-80-210-8318-9.
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Basic information
Original name MICROWAVE INTERFEROMETRY OF ATMOSPHERIC PRESSURE PLASMA JET
Authors FALTÝNEK, Jan (203 Czech Republic, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution) and Vít KUDRLE (203 Czech Republic, belonging to the institution).
Edition BRNO, HAKONE XV: INTERNATIONAL SYMPOSIUM ON HIGH PRESSURE LOW TEMPERATURE PLASMA CHEMISTRY: WITH JOINT COST TD1208 WORKSHOP: NON-EQUILIBRIUM PLASMAS WITH LIQUIDS FOR WATER AND SURFACE TREATMENT, p. 152-154, 3 pp. 2016.
Publisher MASARYKOVA UNIV
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10403 Physical chemistry
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
Publication form electronic version available online
WWW URL
RIV identification code RIV/00216224:14310/16:00113666
Organization unit Faculty of Science
ISBN 978-80-210-8318-9
UT WoS 000393033200033
Keywords in English plasma diagnostics; microwave interferometry; plasma jet
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Marie Šípková, DiS., učo 437722. Changed: 18/4/2020 15:30.
Abstract
Using numerical modeling the microwave interferometry was refined to enable the measurements of electron density in dense, filamentary atmospheric pressure plasmas. The approach includes the wave scattering, collision losses, inhomogeneities in probing electromagnetic field and other factors which are often neglected in plasma interferometry.
Links
ED2.1.00/03.0086, research and development projectName: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy
LO1411, research and development projectName: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)
Investor: Ministry of Education, Youth and Sports of the CR
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