Detailed Information on Publication Record
2020
Optical spectroscopy for sputtering process characterization
BRITUN, Nikolay and Jaroslav HNILICABasic information
Original name
Optical spectroscopy for sputtering process characterization
Authors
BRITUN, Nikolay (56 Belgium) and Jaroslav HNILICA (203 Czech Republic, guarantor, belonging to the institution)
Edition
Journal of Applied Physics, Melville (New York), AIP Publishing, 2020, 0021-8979
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
United States of America
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 2.546
RIV identification code
RIV/00216224:14310/20:00114196
Organization unit
Faculty of Science
UT WoS
000539276400001
Keywords in English
magnetron sputtering; HiPIMS; spectroscopy; plasma diagnostics; sputtering process
Tags
Tags
International impact, Reviewed
Změněno: 29/2/2024 13:48, Mgr. Marie Šípková, DiS.
Abstract
V originále
In this Tutorial, various methods of optical spectroscopy representing certain interest for magnetron discharge characterization are overviewed. The main principles, the implementation examples, and the selected results are given for each technique, accompanied by short discussions and suggestions for further reading. Both passive and active optical methods are covered, including optical absorption and laser-based techniques. The advantages and drawbacks of each diagnostic approach are critically analyzed. Special attention is devoted to the techniques extensively used by the authors in their own work, such as line ratio methods, absorption spectroscopy, interferometry, and laser-induced fluorescence.
Links
| GA15-00863S, research and development project |
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| 90097, large research infrastructures |
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