BRITUN, Nikolay and Jaroslav HNILICA. Optical spectroscopy for sputtering process characterization. Journal of Applied Physics. Melville (New York): AIP Publishing, 2020, vol. 127, No 21, p. 1-21. ISSN 0021-8979. Available from: https://dx.doi.org/10.1063/5.0006586.
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Basic information
Original name Optical spectroscopy for sputtering process characterization
Authors BRITUN, Nikolay (56 Belgium) and Jaroslav HNILICA (203 Czech Republic, guarantor, belonging to the institution).
Edition Journal of Applied Physics, Melville (New York), AIP Publishing, 2020, 0021-8979.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 2.546
RIV identification code RIV/00216224:14310/20:00114196
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1063/5.0006586
UT WoS 000539276400001
Keywords in English magnetron sputtering; HiPIMS; spectroscopy; plasma diagnostics; sputtering process
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Marie Šípková, DiS., učo 437722. Changed: 29/2/2024 13:48.
Abstract
In this Tutorial, various methods of optical spectroscopy representing certain interest for magnetron discharge characterization are overviewed. The main principles, the implementation examples, and the selected results are given for each technique, accompanied by short discussions and suggestions for further reading. Both passive and active optical methods are covered, including optical absorption and laser-based techniques. The advantages and drawbacks of each diagnostic approach are critically analyzed. Special attention is devoted to the techniques extensively used by the authors in their own work, such as line ratio methods, absorption spectroscopy, interferometry, and laser-induced fluorescence.
Links
GA15-00863S, research and development projectName: Studium impulzních plazmatických systémů k depozici tenkých vrstev pro fotonické aplikace
Investor: Czech Science Foundation
90097, large research infrastructuresName: CEPLANT
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