Detailed Information on Publication Record
2020
Synthesis of Nanomaterials and Nanostructures
KAUSHIK, PreetiBasic information
Original name
Synthesis of Nanomaterials and Nanostructures
Authors
KAUSHIK, Preeti
Edition
1st edition. Boca Raton, Chemical Methods for Processing Nanomaterials, p. 38-47, 10 pp. 2020
Publisher
CRC Press-Taylor & Francis group
Other information
Language
English
Type of outcome
Kapitola resp. kapitoly v odborné knize
Confidentiality degree
není předmětem státního či obchodního tajemství
Publication form
storage medium (CD, DVD, flash disk)
References:
Organization unit
Faculty of Science
ISBN
978-0-367-08588-9
Keywords in English
carbon nanotubes, catalytic, plasma, nanoparticles, sol-gel, liquid phase, colloidal, lithography, resist, mask, etching, patterning, proximity effect
Tags
Tags
International impact, Reviewed
Změněno: 6/8/2020 11:54, Preeti Kaushik, Ph.D.
Abstract
V originále
This chapter discusses about the synthesis of nanomaterials and nanostructures. These are prepared by two main approaches: Bottom-up and top-down approach. Bottom up approach describes the synthesis of nanomaterials from small scale to larger scale. Carbon nanotubes synthesis by chemical vapor deposition technique and nanoparticle synthesis using liquid phase synthesis, colloidal method, sol-gel method, hydrothermal synthesis and polyol method comes under bottom-up approach. Conventional carbon nanotube synthesis methods like arc discharge and laser ablation require high temperature for their production. Chemical vapor deposition has been a promising method for carbon nanotube growth in term of their quality and production, Growth mechanism for carbon nanotubes is still an ongoing research based on their growth and pre-treatment conditions. Unlike, top-down approach involves breaking up from larger scale to smaller scale. Lithography is typical example of top-down approach. Photolithography involves the transferring of pattern from mask to the substrate. The typical range of patterning is 100 nm for photolithography while electron-beam lithography can fabricate strcutures even below 10 nm.