KAUSHIK, Preeti. Synthesis of Nanomaterials and Nanostructures. In Vidya Nand Singh. BASU, Amrita and Meena DHANKHAR. Chemical Methods for Processing Nanomaterials. 1st edition. Boca Raton: CRC Press-Taylor & Francis group, 2020, p. 38-47. ISBN 978-0-367-08588-9. Available from: https://dx.doi.org/10.1201/9780429023187.
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Basic information
Original name Synthesis of Nanomaterials and Nanostructures
Authors KAUSHIK, Preeti.
Edition 1st edition. Boca Raton, Chemical Methods for Processing Nanomaterials, p. 38-47, 10 pp. 2020.
Publisher CRC Press-Taylor & Francis group
Other information
Original language English
Type of outcome Chapter(s) of a specialized book
Confidentiality degree is not subject to a state or trade secret
Publication form storage medium (CD, DVD, flash disk)
WWW URL
Organization unit Faculty of Science
ISBN 978-0-367-08588-9
Doi http://dx.doi.org/10.1201/9780429023187
Keywords in English carbon nanotubes, catalytic, plasma, nanoparticles, sol-gel, liquid phase, colloidal, lithography, resist, mask, etching, patterning, proximity effect
Tags topvydavatel
Tags International impact, Reviewed
Changed by Changed by: Preeti Kaushik, Ph.D., učo 454133. Changed: 6/8/2020 11:54.
Abstract
This chapter discusses about the synthesis of nanomaterials and nanostructures. These are prepared by two main approaches: Bottom-up and top-down approach. Bottom up approach describes the synthesis of nanomaterials from small scale to larger scale. Carbon nanotubes synthesis by chemical vapor deposition technique and nanoparticle synthesis using liquid phase synthesis, colloidal method, sol-gel method, hydrothermal synthesis and polyol method comes under bottom-up approach. Conventional carbon nanotube synthesis methods like arc discharge and laser ablation require high temperature for their production. Chemical vapor deposition has been a promising method for carbon nanotube growth in term of their quality and production, Growth mechanism for carbon nanotubes is still an ongoing research based on their growth and pre-treatment conditions. Unlike, top-down approach involves breaking up from larger scale to smaller scale. Lithography is typical example of top-down approach. Photolithography involves the transferring of pattern from mask to the substrate. The typical range of patterning is 100 nm for photolithography while electron-beam lithography can fabricate strcutures even below 10 nm.
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