VIZDA, Frantisek, Ivan OHLÍDAL and Vojtech HRUBY. Influence of Cross-Correlation of Rough Boundaries on Reflectance of Thin Films on GaAs and Si Substrates. In Caldas, M. J. ; Studart, N. PHYSICS OF SEMICONDUCTORS. MELVILLE: AMER INST PHYSICS, 2009, p. 19-20. ISBN 978-0-7354-0736-7. Available from: https://dx.doi.org/10.1063/1.3295367.
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Basic information
Original name Influence of Cross-Correlation of Rough Boundaries on Reflectance of Thin Films on GaAs and Si Substrates
Authors VIZDA, Frantisek (guarantor), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution) and Vojtech HRUBY.
Edition MELVILLE, PHYSICS OF SEMICONDUCTORS, p. 19-20, 2 pp. 2009.
Publisher AMER INST PHYSICS
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10300 1.3 Physical sciences
Country of publisher United States of America
Confidentiality degree is not subject to a state or trade secret
Publication form printed version "print"
WWW URL
Organization unit Faculty of Science
ISBN 978-0-7354-0736-7
ISSN 0094-243X
Doi http://dx.doi.org/10.1063/1.3295367
UT WoS 000281590800009
Keywords in English Rough thin films; Semiconductor substrates; Cross-correlation; Reflectance
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Marie Šípková, DiS., učo 437722. Changed: 20/8/2020 14:44.
Abstract
In this contribution the reflectance of thin films on semiconductor substrates with correlated randomly rough boundaries is analyzed. The theoretical approach is based on the scalar theory of diffraction of light. The numerical analysis of the reflectance is performed for rough thin films on GaAs and Si substrates. This analysis demonstrates that the reflectance depends not only on the rms values of the heights of the irregularities of the boundary roughness but it also depends on values of cross-correlation coefficients between the rough boundaries. The magnitudes of boundary roughness and cross-correlation between the rough boundaries depend on the technological procedures of creating thin film systems. By interpreting the measured reflectance spectra, the values of optical and roughness parameters can be determined.
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