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@inproceedings{1686356,
author = {Přibyl, Roman and Kelarová, Štěpánka and Homola, Vojtěch and Buršíková, Vilma},
address = {Ostrava},
booktitle = {11th International Conference on Nanomaterials - Research & Application (NANOCON 2019)},
doi = {http://dx.doi.org/10.37904/nanocon.2019.8749},
keywords = {PECVD; nanoindentation; profilometry; confocal microscopy; AFM},
howpublished = {elektronická verze "online"},
language = {eng},
location = {Ostrava},
isbn = {978-80-87294-95-6},
pages = {637-641},
publisher = {TANGER Ltd},
title = {Development of plasma enhanced chemical vapor deposition reactor for preparation of oxygen containing organosilazane polymer thin films},
url = {https://doi.org/10.37904/nanocon.2019.8749},
year = {2020}
}
TY - JOUR
ID - 1686356
AU - Přibyl, Roman - Kelarová, Štěpánka - Homola, Vojtěch - Buršíková, Vilma
PY - 2020
TI - Development of plasma enhanced chemical vapor deposition reactor for preparation of oxygen containing organosilazane polymer thin films
PB - TANGER Ltd
CY - Ostrava
SN - 9788087294956
KW - PECVD
KW - nanoindentation
KW - profilometry
KW - confocal microscopy
KW - AFM
UR - https://doi.org/10.37904/nanocon.2019.8749
L2 - https://doi.org/10.37904/nanocon.2019.8749
N2 - In the present work we focused on the development of a low pressure capacitively coupled radio-frequency PECVD reactor for preparation of plasma-polymer thin films from organosilazane precursors. The dependence of the film growth from hexamethyldisilazane (HMDSZ, SiN2C6H19) and oxygen containing mixtures on the deposition parameters was studied. The time evolution of the negative self bias voltage on the thin film growth was studied. It was found, that the changes in the self bias voltage significantly influenced the surface structure and the properties of the growing films. The mechanical properties of the films were studied using nanoindentation technique and the surface structure was studied using atomic force microscopy (AFM).
ER -
PŘIBYL, Roman, Štěpánka KELAROVÁ, Vojtěch HOMOLA and Vilma BURŠÍKOVÁ. Development of plasma enhanced chemical vapor deposition reactor for preparation of oxygen containing organosilazane polymer thin films. Online. In \textit{11th International Conference on Nanomaterials - Research \&{} Application (NANOCON 2019)}. Ostrava: TANGER Ltd, 2020, p.~637-641. ISBN~978-80-87294-95-6. Available from: https://dx.doi.org/10.37904/nanocon.2019.8749.
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