Detailed Information on Publication Record
2020
Ellipsometric characterization of inhomogeneous thin films with complicated thickness non-uniformity: application to inhomogeneous polymer-like thin films
OHLÍDAL, Ivan, Jiří VOHÁNKA, Vilma BURŠÍKOVÁ, Václav ŠULC, Štěpán ŠUSTEK et. al.Basic information
Original name
Ellipsometric characterization of inhomogeneous thin films with complicated thickness non-uniformity: application to inhomogeneous polymer-like thin films
Authors
OHLÍDAL, Ivan (203 Czech Republic, guarantor, belonging to the institution), Jiří VOHÁNKA (203 Czech Republic, belonging to the institution), Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution), Václav ŠULC (203 Czech Republic), Štěpán ŠUSTEK (203 Czech Republic) and Miloslav OHLÍDAL (203 Czech Republic)
Edition
Optics Express, Washington, D.C. Optical Society of America, 2020, 1094-4087
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10306 Optics
Country of publisher
United States of America
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 3.894
RIV identification code
RIV/00216224:14310/20:00114508
Organization unit
Faculty of Science
UT WoS
000592953200109
Keywords in English
Chemical vapor deposition; Mueller matrices; Optical constants;Optical properties;Thin film applications;Thin films
Tags
Tags
International impact, Reviewed
Změněno: 13/1/2021 16:54, Mgr. Marie Šípková, DiS.
Abstract
V originále
The method of variable angle spectroscopic ellipsometry usable for the complete optical characterization of inhomogeneous thin films exhibiting complicated thickness non-uniformity together with transition layers at their lower boundaries is presented in this paper. The inhomogeneity of these films is described by means of the multiple-beam interference model. The thickness non-uniformity is taken into account by averaging the elements of the Mueller matrix along the area of the light spot of the ellipsometer on the films. The local thicknesses are expressed using polynomials in the coordinates along the surfaces of the films. The efficiency of the method is illustrated by means of the optical characterization of a selected sample of the polymer-like thin film of SiOxCyHz prepared by plasma enhanced chemical vapor deposition onto the silicon single crystal substrate. The Campi-Coriasso dispersion model is used to determine the spectral dependencies of the optical constants at the upper and lower boundaries of this film. The profiles of these optical constants are determined too. The thickness non-uniformity is described using a model with local thicknesses given by the polynomial with at most quadratic terms. In this way it is possible to determine the geometry of the upper boundary. The thickness and spectral dependencies of the optical constants of the transition layer are determined as well. Imaging spectroscopic reflectometry is utilized for confirming the results concerning the thickness non-uniformity obtained using ellipsometry.
Links
GA19-15240S, research and development project |
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LM2018097, research and development project |
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