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@article{1755516, author = {Mascaretti, Luca and Barman, Tapan and Münz, Filip and Bricchi, Beatrice Roberta}, article_number = {554}, doi = {http://dx.doi.org/10.1016/j.apsusc.2021.149543}, keywords = {Titanium nitride thin films,Magnetron sputtering,Plasmonics,Spectroscopic ellipsometry,Electrical resistivity}, issn = {0169-4332}, journal = {Applied Surface Science}, title = {Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering}, volume = {2021}, year = {2021} }
TY - JOUR ID - 1755516 AU - Mascaretti, Luca - Barman, Tapan - Münz, Filip - Bricchi, Beatrice Roberta PY - 2021 TI - Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering JF - Applied Surface Science VL - 2021 IS - 554 SP - 149543 EP - 149543 PB - Elsevier Science SN - 01694332 KW - Titanium nitride thin films,Magnetron sputtering,Plasmonics,Spectroscopic ellipsometry,Electrical resistivity N2 - We report the effect of radiofrequency (RF) substrate biasing during the sputtering process on the structural, optical and electrical properties of TiN films. We employ spectroscopic ellipsometry as a sensible characterization method and we show that a moderate RF power, despite reducing the grain size, allows to achieve optimal plasmonic quality factors and a low resistivity. ER -
MASCARETTI, Luca, Tapan BARMAN, Filip MÜNZ and Beatrice Roberta BRICCHI. Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering. \textit{Applied Surface Science}. Elsevier Science, 2021, vol.~2021, No~554, p.~149543-149551. ISSN~0169-4332. Available from: https://dx.doi.org/10.1016/j.apsusc.2021.149543.
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