MASCARETTI, Luca, Tapan BARMAN, Filip MÜNZ and Beatrice Roberta BRICCHI. Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering. Applied Surface Science. Elsevier Science, 2021, vol. 2021, No 554, p. 149543-149551. ISSN 0169-4332. Available from: https://dx.doi.org/10.1016/j.apsusc.2021.149543.
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Basic information
Original name Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering
Authors MASCARETTI, Luca, Tapan BARMAN, Filip MÜNZ and Beatrice Roberta BRICCHI.
Edition Applied Surface Science, Elsevier Science, 2021, 0169-4332.
Other information
Type of outcome Article in a journal
Confidentiality degree is not subject to a state or trade secret
Impact factor Impact factor: 7.392
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.apsusc.2021.149543
UT WoS 000647733600004
Keywords in English Titanium nitride thin films,Magnetron sputtering,Plasmonics,Spectroscopic ellipsometry,Electrical resistivity
Tags RIV ne
Changed by Changed by: Mgr. Filip Münz, PhD., učo 108960. Changed: 25/3/2021 19:16.
Abstract
We report the effect of radiofrequency (RF) substrate biasing during the sputtering process on the structural, optical and electrical properties of TiN films. We employ spectroscopic ellipsometry as a sensible characterization method and we show that a moderate RF power, despite reducing the grain size, allows to achieve optimal plasmonic quality factors and a low resistivity.
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