Thermal stability of Ti/Ni multilayer Thin films

D 2021

Thermal stability of Ti/Ni multilayer Thin films

VÁCLAVIK, Richard, Lukáš ZÁBRANSKÝ, Pavel SOUČEK, Pavel SŤAHEL, Jiří BURŠÍK et. al.

Basic information

Original name

Thermal stability of Ti/Ni multilayer Thin films

Authors

VÁCLAVIK, Richard (703 Slovakia, guarantor, belonging to the institution), Lukáš ZÁBRANSKÝ (203 Czech Republic, belonging to the institution), Pavel SOUČEK (203 Czech Republic, belonging to the institution), Pavel SŤAHEL (203 Czech Republic, belonging to the institution), Jiří BURŠÍK, Tomáš FOŘT and Vilma BURŠÍKOVÁ (203 Czech Republic, belonging to the institution)

Edition

Ostrava, NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application, p. 518-523, 6 pp. 2021

Publisher

TANGER Ltd.

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

21000 2.10 Nano-technology

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

Publication form

electronic version available online

References:

URL

RIV identification code

RIV/00216224:14310/21:00118928

Organization unit

Faculty of Science

ISBN

978-80-87294-98-7

ISSN

DOI

http://dx.doi.org/10.37904/nanocon.2020.3776

UT WoS

000664505500088

Keywords in English

Ti/Ni; multilayers; magnetron sputtering; nanoindentation; annealing

Abstract

V originále

In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100–800°C.

Links

GA20-11321S, research and development project

Name: Vliv mikrostruktury a povrchových úprav na absorpci vodíku v bio-kompatibilních slitinách

Investor: Czech Science Foundation

LO1411, research and development project

Name: Rozvoj centra pro nízkonákladové plazmové a nanotechnologické povrchové úpravy (Acronym: CEPLANT plus)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

VÁCLAVIK, Richard, Lukáš ZÁBRANSKÝ, Pavel SOUČEK, Pavel SŤAHEL, Jiří BURŠÍK, Tomáš FOŘT and Vilma BURŠÍKOVÁ. Thermal stability of Ti/Ni multilayer Thin films. Online. In NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application. Ostrava: TANGER Ltd., 2021, p. 518-523. ISBN 978-80-87294-98-7. Available from: https://dx.doi.org/10.37904/nanocon.2020.3776.

@inproceedings{1760383,
   author = {Václavik, Richard and Zábranský, Lukáš and Souček, Pavel and Sťahel, Pavel and Buršík, Jiří and Fořt, Tomáš and Buršíková, Vilma},
   address = {Ostrava},
   booktitle = {NANOCON 2020: 12th International Conference on Nanomaterials - Research & Application},
   doi = {http://dx.doi.org/10.37904/nanocon.2020.3776},
   keywords = {Ti/Ni; multilayers; magnetron sputtering; nanoindentation; annealing},
   howpublished = {elektronická verze "online"},
   language = {eng},
   location = {Ostrava},
   isbn = {978-80-87294-98-7},
   pages = {518-523},
   publisher = {TANGER Ltd.},
   title = {Thermal stability of Ti/Ni multilayer Thin films},
   url = {https://doi.org/10.37904/nanocon.2020.3776},
   year = {2021}
}

TY  - JOUR
ID  - 1760383
AU  - Václavik, Richard - Zábranský, Lukáš - Souček, Pavel - Sťahel, Pavel - Buršík, Jiří - Fořt, Tomáš - Buršíková, Vilma
PY  - 2021
TI  - Thermal stability of Ti/Ni multilayer Thin films
PB  - TANGER Ltd.
CY  - Ostrava
SN  - 9788087294987
KW  - Ti/Ni
KW  - multilayers
KW  - magnetron sputtering
KW  - nanoindentation
KW  - annealing
UR  - https://doi.org/10.37904/nanocon.2020.3776
N2  - In this work, thermal stability and mechanical properties of Ti/Ni multilayer thin films were studied. The multilayer thin films were synthesised by alternately depositing Ti and Ni layers using magnetron sputtering. The thickness of constituent layers of Ti and Ni varied from 1.7 nm to 10 nm, and one coating was deposited by simultaneous sputtering of both targets. Single crystalline silicon was used as a substrate. The effects of thermal treatment on the mechanical properties were studied using nanoindentation and discussed in relation to microstructure evaluated by X-ray diffraction. Annealing was carried out under low-pressure conditions for 2 hours in the range of 100–800°C.
ER  -

VÁCLAVIK, Richard, Lukáš ZÁBRANSKÝ, Pavel SOUČEK, Pavel SŤAHEL, Jiří BURŠÍK, Tomáš FOŘT and Vilma BURŠÍKOVÁ. Thermal stability of Ti/Ni multilayer Thin films. Online. In \textit{NANOCON 2020: 12th International Conference on Nanomaterials - Research \&{} Application}. Ostrava: TANGER Ltd., 2021, p.~518-523. ISBN~978-80-87294-98-7. Available from: https://dx.doi.org/10.37904/nanocon.2020.3776.

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