SHEKARGOFTAR, Masoud, Jan POSPISIL, Matouš KRATOCHVÍL, Július VIDA, Pavel SOUČEK and Tomáš HOMOLA. Low‐Temperature and Rapid Deposition of an SnO2 Layer from a Colloidal Nanoparticle Dispersion for Use in Planar Perovskite Solar Cells. Energy Technology. Weinheim: Wiley-VCH GmbH, 2021, vol. 9, No 5, p. "2001076-1"-"2001076-7", 7 pp. ISSN 2194-4288. Available from: https://dx.doi.org/10.1002/ente.202001076.
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Basic information
Original name Low‐Temperature and Rapid Deposition of an SnO2 Layer from a Colloidal Nanoparticle Dispersion for Use in Planar Perovskite Solar Cells
Authors SHEKARGOFTAR, Masoud (364 Islamic Republic of Iran, guarantor, belonging to the institution), Jan POSPISIL, Matouš KRATOCHVÍL, Július VIDA (703 Slovakia, belonging to the institution), Pavel SOUČEK (203 Czech Republic, belonging to the institution) and Tomáš HOMOLA (703 Slovakia, belonging to the institution).
Edition Energy Technology, Weinheim, Wiley-VCH GmbH, 2021, 2194-4288.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10305 Fluids and plasma physics
Country of publisher Germany
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 4.149
RIV identification code RIV/00216224:14310/21:00118954
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1002/ente.202001076
UT WoS 000639030000001
Keywords in English electron transport layers; low-temperature plasma; perovskite solar cells; SnO2
Tags rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. Marie Šípková, DiS., učo 437722. Changed: 27/2/2024 13:50.
Abstract
Deposition of the electron transport layer (ETL) is an important step in the manufacture of low‐cost, solution‐processed perovskite solar cells (PSCs). Thermal annealing processes account for a major part of the energy consumption involved in the fabrication of PSCs. The current paper presents a plasma‐based and highly convenient method (5 min, <60 °C) for the deposition of SnO2 films (PT‐SnO2) from a colloidal nanoparticle dispersion. A comparative evaluation of PT‐SnO2 films with those created by state‐of‐the‐art thermal annealing (30 min, 180 °C) (TA‐SnO2) is made herein. The key mechanism in the formation of the SnO2 layer is explained in relation to the evaporation of the dispersion medium. This comparison of PT‐SnO2 and TA‐SnO2 indicates a considerable difference in terms of energy consumption directly relevant to the low‐cost manufacture of PSCs. Photoluminescence analysis revealed no particular differences in the charge extraction of the two types of SnO2 films. The SnO2 films were subsequently employed as an ETL in planar n‐i‐p PSCs. Results revealed that the PSC resulting from PT‐SnO2 yielded an efficiency of 15.17%, similar to that of 15.91% corresponding to TA‐SnO2. In addition, the PSC fabricated on the PT‐SnO2 maintaining ≈80% of its initial performance after 21 days in ambient conditions.
Links
GJ19-14770Y, research and development projectName: Plazmatem produkované nanostrukturované vrstvy pro flexibilní materiály nové generace
Investor: Czech Science Foundation
90097, large research infrastructuresName: CEPLANT
90110, large research infrastructuresName: CzechNanoLab
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