Microstructure of titanium coatings controlled by pulse
sequence in multipulse HiPIMS

J 2021

Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS

SOUČEK, Pavel, Jaroslav HNILICA, Peter KLEIN, Matej FEKETE, Petr VAŠINA et. al.

Basic information

Original name

Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS

Authors

SOUČEK, Pavel (203 Czech Republic, guarantor, belonging to the institution), Jaroslav HNILICA (203 Czech Republic, belonging to the institution), Peter KLEIN (703 Slovakia, belonging to the institution), Matej FEKETE (703 Slovakia, belonging to the institution) and Petr VAŠINA (203 Czech Republic, belonging to the institution)

Edition

Surface and Coatings Technology, Elsevier B.V. 2021, 0257-8972

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Switzerland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 4.865

RIV identification code

RIV/00216224:14310/21:00119165

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.surfcoat.2021.127624

UT WoS

000697566200041

Keywords in English

Titanium; Microstructure control; Magnetron sputtering; HiPIMS; Multipulse

Abstract

V originále

The deposition rate, as well as the structure of a coating for a given magnetron sputtered material are determined by the plasma properties which are significantly dependent on the type of plasma generation. Single-pulse high power impulse magnetron sputtering (s-HiPIMS), multipulse HiPIMS (m-HiPIMS) with the same energy per pulse sequence and conventional direct current magnetron sputtering (DC-MS) were employed to deposit metallic Ti coatings. Varying the number of pulses in one pulse sequence in multipulse HiPIMS operation enables us to influence the ion fluxes on the substrate and the ionisation of the sputtered titanium. The grain size for the HiPIMS-deposited coatings was in the range of 5 to 25 nm depending on the number of pulses in the pulse sequence, whereas it was 15 nm for the coating prepared by the DC-MS. By the use of multipulse HiPIMS, it was also possible to achieve coatings with a smoother surface morphology and lower roughness as well rougher coatings with larger asperities and higher roughness compared to DC-MS. The texture and the deposition rate were significantly affected by the number of pulses, too.

Links

GA19-00579S, research and development project

Name: Pokročilá diagnostika reaktivního HiPIMS plazmatu pro depozici oxidových, nitridových a sulfidových vrstev

Investor: Czech Science Foundation

LM2018097, research and development project

Name: Centrum výzkumu a vývoje plazmatu a nanotechnologických povrchových úprav (Acronym: CEPLANT)

Investor: Ministry of Education, Youth and Sports of the CR

Citovat

SOUČEK, Pavel, Jaroslav HNILICA, Peter KLEIN, Matej FEKETE and Petr VAŠINA. Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS. Surface and Coatings Technology. Elsevier B.V., 2021, vol. 423, October, p. "127624", 9 pp. ISSN 0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2021.127624.

@article{1788837,
   author = {Souček, Pavel and Hnilica, Jaroslav and Klein, Peter and Fekete, Matej and Vašina, Petr},
   article_number = {October},
   doi = {http://dx.doi.org/10.1016/j.surfcoat.2021.127624},
   keywords = {Titanium; Microstructure control; Magnetron sputtering; HiPIMS; Multipulse},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface and Coatings Technology},
   title = {Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS},
   url = {https://doi.org/10.1016/j.surfcoat.2021.127624},
   volume = {423},
   year = {2021}
}

TY  - JOUR
ID  - 1788837
AU  - Souček, Pavel - Hnilica, Jaroslav - Klein, Peter - Fekete, Matej - Vašina, Petr
PY  - 2021
TI  - Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS
JF  - Surface and Coatings Technology
VL  - 423
IS  - October
SP  - "127624"
EP  - "127624"
PB  - Elsevier B.V.
SN  - 02578972
KW  - Titanium
KW  - Microstructure control
KW  - Magnetron sputtering
KW  - HiPIMS
KW  - Multipulse
UR  - https://doi.org/10.1016/j.surfcoat.2021.127624
N2  - The deposition rate, as well as the structure of a coating for a given magnetron sputtered material are determined by the plasma properties which are significantly dependent on the type of plasma generation. Single-pulse high power impulse magnetron sputtering (s-HiPIMS), multipulse HiPIMS (m-HiPIMS) with the same energy per pulse sequence and conventional direct current magnetron sputtering (DC-MS) were employed to deposit metallic Ti coatings. Varying the number of pulses in one pulse sequence in multipulse HiPIMS operation enables us to influence the ion fluxes on the substrate and the ionisation of the sputtered titanium. The grain size for the HiPIMS-deposited coatings was in the range of 5 to 25 nm depending on the number of pulses in the pulse sequence, whereas it was 15 nm for the coating prepared by the DC-MS. By the use of multipulse HiPIMS, it was also possible to achieve coatings with a smoother surface morphology and lower roughness as well rougher coatings with larger asperities and higher roughness compared to DC-MS. The texture and the deposition rate were significantly affected by the number of pulses, too.
ER  -

SOUČEK, Pavel, Jaroslav HNILICA, Peter KLEIN, Matej FEKETE and Petr VAŠINA. Microstructure of titanium coatings controlled by pulse sequence in multipulse HiPIMS. \textit{Surface and Coatings Technology}. Elsevier B.V., 2021, vol.~423, October, p.~''127624'', 9 pp. ISSN~0257-8972. Available from: https://dx.doi.org/10.1016/j.surfcoat.2021.127624.

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