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@misc{1802098,
author = {Dvořák, Pavel and Žemlička, Radek and Přibyl, Roman and Tkáčik, Maroš and Pálenik, Juraj and Vašina, Petr and Skopal, Petr and Navrátil, Zdeněk and Buršíková, Vilma},
booktitle = {8th Plasma Science & Entrepreneurship Workshop},
keywords = {higher harmonic frequencies;plasma;capacitively coupled discharges},
language = {eng},
note = {Součástí publikace je také krátký příspěvěk v Book of abstracts, str. 17.},
title = {Higher harmonic frequencies in a capacitively coupled plasma},
year = {2021}
}
TY - SLIDE
ID - 1802098
AU - Dvořák, Pavel - Žemlička, Radek - Přibyl, Roman - Tkáčik, Maroš - Pálenik, Juraj - Vašina, Petr - Skopal, Petr - Navrátil, Zdeněk - Buršíková, Vilma
PY - 2021
TI - Higher harmonic frequencies in a capacitively coupled plasma
N1 - Součástí publikace je také krátký příspěvěk v Book of abstracts, str. 17.
KW - higher harmonic frequencies;plasma;capacitively coupled discharges
N2 - Nonlinear nature of sheaths leads to nonlinear VA characteristics and generation of higher harmonic frequencies in capacitively coupled discharges. Higher harmonic frequencies are known to influence heating of electrons, especially at low pressure, and to be very sensitive to number of discharge parameters, which enables to use higher harmonics for monitoring of various deposition and etching processes. The presentation summarizes the topic of probe measurements of higher harmonic frequencies of plasma potential, nonlinear modeling of behaviour of higher harmonic frequencies in capacitive discharges and explanation of the mechanism which leads to the sensitive reaction of higher harmonics on the presence of a deposited or etched thin film.
ER -
DVOŘÁK, Pavel, Radek ŽEMLIČKA, Roman PŘIBYL, Maroš TKÁČIK, Juraj PÁLENIK, Petr VAŠINA, Petr SKOPAL, Zdeněk NAVRÁTIL and Vilma BURŠÍKOVÁ. Higher harmonic frequencies in a capacitively coupled plasma. In \textit{8th Plasma Science \&{} Entrepreneurship Workshop}. 2021.
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