JANČA, Jan, Karel NAVRÁTIL and Zdeněk BOCHNÍČEK. Depozice a charakterizace tenkých vrstev připravených ze směsi TEOS+O2 ve vf plazmatu (RF plasma deposition and characterization of organosilicon thin films from TEOS + O2 gas mixture). In 17th Symp. on Plasma Physics and Technology. Praha: ČVUT, 1995, p. 275-277. ISBN 80-010-1344-8.
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Basic information
Original name Depozice a charakterizace tenkých vrstev připravených ze směsi TEOS+O2 ve vf plazmatu
Name (in English) RF plasma deposition and characterization of organosilicon thin films from TEOS + O2 gas mixture
Authors JANČA, Jan, Karel NAVRÁTIL and Zdeněk BOCHNÍČEK.
Edition Praha, 17th Symp. on Plasma Physics and Technology, p. 275-277, 1995.
Publisher ČVUT
Other information
Type of outcome Chapter(s) of a specialized book
Field of Study 10305 Fluids and plasma physics
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/95:00000353
Organization unit Faculty of Science
ISBN 80-010-1344-8
Changed by Changed by: prof. RNDr. Jan Janča, DrSc., učo 29. Changed: 25/2/1999 01:10.
Links
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
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