ZAJÍČKOVÁ, Lenka, Ivan OHLÍDAL and Jan JANČA. Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses. Thin Solid Films. UK Oxford: Elsevier science, 1996, vol. 1996, No 280, p. 26-36. ISSN 0040-6090. |
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@article{197508, author = {Zajíčková, Lenka and Ohlídal, Ivan and Janča, Jan}, article_location = {UK Oxford}, article_number = {280}, keywords = {PECVD; TEOS}, language = {eng}, issn = {0040-6090}, journal = {Thin Solid Films}, title = {Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses}, volume = {1996}, year = {1996} }
TY - JOUR ID - 197508 AU - Zajíčková, Lenka - Ohlídal, Ivan - Janča, Jan PY - 1996 TI - Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses JF - Thin Solid Films VL - 1996 IS - 280 SP - 26 EP - 26 PB - Elsevier science SN - 00406090 KW - PECVD KW - TEOS ER -
ZAJÍČKOVÁ, Lenka, Ivan OHLÍDAL and Jan JANČA. Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses. \textit{Thin Solid Films}. UK Oxford: Elsevier science, 1996, vol.~1996, No~280, p.~26-36. ISSN~0040-6090.
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