Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses

ZAJÍČKOVÁ, Lenka, Ivan OHLÍDAL and Jan JANČA. Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses. Thin Solid Films. UK Oxford: Elsevier science, 1996, vol. 1996, No 280, p. 26-36. ISSN 0040-6090.

Basic information

Original name

Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses

Authors

ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Ivan OHLÍDAL (203 Czech Republic) and Jan JANČA (203 Czech Republic)

Edition

Thin Solid Films, UK Oxford, Elsevier science, 1996, 0040-6090

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Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10305 Fluids and plasma physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/96:00000441

Organization unit

Faculty of Science

Keywords in English

PECVD; TEOS

Tags

PECVD, TEOS

Tags

International impact, Reviewed

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Links

MSM 143100003, plan (intention)

Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates