OHLÍDAL, Ivan, Daniel FRANTA, Bohuslav REZEK a Miloslav OHLÍDAL. Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy. In ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis. Chichester, England, UK: John Willey & Sons, 1997, s. 1051-1054. ISBN 0-471-97827-2.
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Základní údaje
Originální název Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy
Autoři OHLÍDAL, Ivan, Daniel FRANTA, Bohuslav REZEK a Miloslav OHLÍDAL.
Vydání Chichester, England, UK, ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis, s. 1051-1054, 1997.
Nakladatel John Willey & Sons
Další údaje
Originální jazyk angličtina
Typ výsledku Stať ve sborníku
Obor 10302 Condensed matter physics
Stát vydavatele Velká Británie a Severní Irsko
Utajení není předmětem státního či obchodního tajemství
WWW URL
Organizační jednotka Přírodovědecká fakulta
ISBN 0-471-97827-2
UT WoS 000074082100243
Změnil Změnil: Mgr. Daniel Franta, Ph.D., učo 2000. Změněno: 19. 12. 2003 19:22.
Anotace
Surfaces of solids exhibiting slight random roughness are often encountered in practice. This roughness influences some physical and chemical properties of these surface (e.g. both the optical and electrical properties of the solid surfaces can be influenced by this roughness in an enormous way). The situation is mostly complicated by the fact that the rough surfaces are covered with thin films. This fact must be respected at studies of these rough surfaces as well. In this paper a method based on a combination of spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy (AFM) allowing to characterize the slightly rough surfaces covered with very thin films will be described. This method will be illustrated by results achieved at the analysis of the slightly rough surfaces of silicon single crystal covered with native oxide layers.
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