OHLÍDAL, Ivan, Daniel FRANTA, Bohuslav REZEK and Miloslav OHLÍDAL. Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy. In ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis. Chichester, England, UK: John Willey & Sons, 1997, p. 1051-1054. ISBN 0-471-97827-2.
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Basic information
Original name Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy
Authors OHLÍDAL, Ivan, Daniel FRANTA, Bohuslav REZEK and Miloslav OHLÍDAL.
Edition Chichester, England, UK, ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis, p. 1051-1054, 1997.
Publisher John Willey & Sons
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10302 Condensed matter physics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
WWW URL
Organization unit Faculty of Science
ISBN 0-471-97827-2
UT WoS 000074082100243
Changed by Changed by: Mgr. Daniel Franta, Ph.D., učo 2000. Changed: 19/12/2003 19:22.
Abstract
Surfaces of solids exhibiting slight random roughness are often encountered in practice. This roughness influences some physical and chemical properties of these surface (e.g. both the optical and electrical properties of the solid surfaces can be influenced by this roughness in an enormous way). The situation is mostly complicated by the fact that the rough surfaces are covered with thin films. This fact must be respected at studies of these rough surfaces as well. In this paper a method based on a combination of spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy (AFM) allowing to characterize the slightly rough surfaces covered with very thin films will be described. This method will be illustrated by results achieved at the analysis of the slightly rough surfaces of silicon single crystal covered with native oxide layers.
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