D 1997

Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy

OHLÍDAL, Ivan, Daniel FRANTA, Bohuslav REZEK and Miloslav OHLÍDAL

Basic information

Original name

Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy

Authors

OHLÍDAL, Ivan, Daniel FRANTA, Bohuslav REZEK and Miloslav OHLÍDAL

Edition

Chichester, England, UK, ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis, p. 1051-1054, 1997

Publisher

John Willey & Sons

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10302 Condensed matter physics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

Organization unit

Faculty of Science

ISBN

0-471-97827-2

UT WoS

000074082100243
Změněno: 19/12/2003 19:22, Mgr. Daniel Franta, Ph.D.

Abstract

V originále

Surfaces of solids exhibiting slight random roughness are often encountered in practice. This roughness influences some physical and chemical properties of these surface (e.g. both the optical and electrical properties of the solid surfaces can be influenced by this roughness in an enormous way). The situation is mostly complicated by the fact that the rough surfaces are covered with thin films. This fact must be respected at studies of these rough surfaces as well. In this paper a method based on a combination of spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy (AFM) allowing to characterize the slightly rough surfaces covered with very thin films will be described. This method will be illustrated by results achieved at the analysis of the slightly rough surfaces of silicon single crystal covered with native oxide layers.