Detailed Information on Publication Record
1997
Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy
OHLÍDAL, Ivan, Daniel FRANTA, Bohuslav REZEK and Miloslav OHLÍDALBasic information
Original name
Analysis of single layers placed on slightly rough surfaces by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy
Authors
OHLÍDAL, Ivan, Daniel FRANTA, Bohuslav REZEK and Miloslav OHLÍDAL
Edition
Chichester, England, UK, ECASIA 97 - 7th European Conference on Applications of Surface and Interface Analysis, p. 1051-1054, 1997
Publisher
John Willey & Sons
Other information
Language
English
Type of outcome
Stať ve sborníku
Field of Study
10302 Condensed matter physics
Country of publisher
United Kingdom of Great Britain and Northern Ireland
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Organization unit
Faculty of Science
ISBN
0-471-97827-2
UT WoS
000074082100243
Změněno: 19/12/2003 19:22, Mgr. Daniel Franta, Ph.D.
Abstract
V originále
Surfaces of solids exhibiting slight random roughness are often encountered in practice. This roughness influences some physical and chemical properties of these surface (e.g. both the optical and electrical properties of the solid surfaces can be influenced by this roughness in an enormous way). The situation is mostly complicated by the fact that the rough surfaces are covered with thin films. This fact must be respected at studies of these rough surfaces as well. In this paper a method based on a combination of spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy (AFM) allowing to characterize the slightly rough surfaces covered with very thin films will be described. This method will be illustrated by results achieved at the analysis of the slightly rough surfaces of silicon single crystal covered with native oxide layers.