OHLÍDAL, Ivan, Daniel FRANTA, Miloslav OHLÍDAL, Martin VIČAR and Petr KLAPETEK. Comparison of AFM and optical methods at measuring nanometric surface roughness. In Proceedings of the 3th Seminar on Quantitative Microscopy. Braunschweig, SRN: Physikalisch-Technische Bundesanstalt, 1998, p. 123-129. ISBN 3-89701-280-4.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name Comparison of AFM and optical methods at measuring nanometric surface roughness
Authors OHLÍDAL, Ivan (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic), Miloslav OHLÍDAL, Martin VIČAR (203 Czech Republic) and Petr KLAPETEK (203 Czech Republic).
Edition Braunschweig, SRN, Proceedings of the 3th Seminar on Quantitative Microscopy, p. 123-129, 1998.
Publisher Physikalisch-Technische Bundesanstalt
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10302 Condensed matter physics
Country of publisher Germany
Confidentiality degree is not subject to a state or trade secret
WWW URL
RIV identification code RIV/00216224:14310/98:00002080
Organization unit Faculty of Science
ISBN 3-89701-280-4
Changed by Changed by: Mgr. Daniel Franta, Ph.D., učo 2000. Changed: 19/12/2003 19:29.
Abstract
In this contribution a comparison of the values of basic quantities characterizing random nanometric surface roughness determined by AFM and optical methods is presented.
Links
GA101/98/0772, research and development projectName: Návrh a konstrukce zařízení pro in-situ měření plošné homogenity tenkých vrstev
Investor: Czech Science Foundation, Design and construction of the equipment for in-situ measurement of thin film surface homogeneity
GA202/98/0988, research and development projectName: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod
Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
VS96084, research and development projectName: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague
PrintDisplayed: 20/7/2024 11:22