Comparison of AFM and optical methods at measuring nanometric surface roughness

OHLÍDAL, Ivan, Daniel FRANTA, Miloslav OHLÍDAL, Martin VIČAR and Petr KLAPETEK. Comparison of AFM and optical methods at measuring nanometric surface roughness. In Proceedings of the 3th Seminar on Quantitative Microscopy. Braunschweig, SRN: Physikalisch-Technische Bundesanstalt, 1998, p. 123-129. ISBN 3-89701-280-4.

Basic information

Original name

Comparison of AFM and optical methods at measuring nanometric surface roughness

Authors

OHLÍDAL, Ivan (203 Czech Republic, guarantor), Daniel FRANTA (203 Czech Republic), Miloslav OHLÍDAL, Martin VIČAR (203 Czech Republic) and Petr KLAPETEK (203 Czech Republic)

Edition

Braunschweig, SRN, Proceedings of the 3th Seminar on Quantitative Microscopy, p. 123-129, 1998

Publisher

Physikalisch-Technische Bundesanstalt

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Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10302 Condensed matter physics

Country of publisher

Germany

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

RIV identification code

RIV/00216224:14310/98:00002080

Organization unit

Faculty of Science

ISBN

3-89701-280-4

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Abstract

V originále

In this contribution a comparison of the values of basic quantities characterizing random nanometric surface roughness determined by AFM and optical methods is presented.

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Links

GA101/98/0772, research and development project	Name: Návrh a konstrukce zařízení pro in-situ měření plošné homogenity tenkých vrstev Investor: Czech Science Foundation, Design and construction of the equipment for in-situ measurement of thin film surface homogeneity
GA202/98/0988, research and development project	Name: Charakterizace vrstevnatých systémů s náhodně drsnými rozhraními pomocí optických a rtg metod Investor: Czech Science Foundation, Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
VS96084, research and development project	Name: Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze Investor: Ministry of Education, Youth and Sports of the CR, Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague