Detailed Information on Publication Record
1999
The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films
ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ and Daniel FRANTABasic information
Original name
The influence of substrate emissivity on plasma enhanced CVD of diamond-like carbon films
Authors
ZAJÍČKOVÁ, Lenka (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic) and Daniel FRANTA (203 Czech Republic)
Edition
Czechoslovak Journal of Physics, Praha, 1999, 0011-4626
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
References:
Impact factor
Impact factor: 0.328
RIV identification code
RIV/00216224:14310/99:00001115
Organization unit
Faculty of Science
UT WoS
000082265000008
Tags
International impact, Reviewed
Změněno: 17/7/2007 17:27, doc. Mgr. Lenka Zajíčková, Ph.D.
Abstract
V originále
In a planar capacitively coupled RF reactor we deposited DLC films from the mixture of methane and argon. The self biased electrode was in a poor thermal contact with walls of the reactor, neither water cooled nor electrical heated by a special external circuit. The temperatures were continuously increasing even during the longest deposition time of 120 min and differed for the electrode and the silicons of different specific resistances correlated to their emissivities. Ellipsometric and reflectance measurements of films deposited on two different silicon substrates of different emissivities were carried out. Their deposition rate depended significantly on the silicon emissivities because of the different temperatures. The influence of the silicon substrate emissivity on the mechanical properties of DLC films were studied by means of Vickers microhardness tester.
Links
| GV106/96/K245, research and development project |
| ||
| MSM 143100003, plan (intention) |
|